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Secondary ion mass spectrometry signatures for verifying declarations of fissile-material production

机译:二次离子质谱签名,用于验证易裂变材料生产的声明

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摘要

Direct analysis of uranium enrichment facility components were performed using secondary ion mass spectrometry (SIMS). A standard protocol was developed to enable preparation of SIMS samples from a corroded pipe piece without disturbing the corrosion layer. Unique uranium, oxygen and fluorine containing signatures were discovered in the corrosion layer by performing a mass scan of the region of interest from 230 to 280 amu. These signatures identified the source of the corrosion layer as uranium hexafluoride (UF6) or an associated hydrolysis product. Isotopic analysis of the corrosion layer determined enrichment of U-235 to a value of 0.0116 +/- 0.0019 for the U-235/U-238 isotopic ratio as compared to the NIST traceable standard (CRM 112-A) with a natural U-235/U-238 isotopic ratio of 0.007254 +/- 0.000004. SIMS depth analysis revealed that the corrosion layer was isotopically homogenous to a depth of similar to 23.5 mu m. Optical profilometry measurements prior to and following SIMS depth analysis were used to determine a sputter rate of 0.48 nm/s for 18.5 keV O- ion bombardment of the corrosion layer. The data presented is conclusive evidence that SIMS depth analysis can be used to identify novel nuclear archeology signatures from uranium enrichment components and perform meaningful isotopic analysis of these signatures. (C) 2014 Elsevier Ltd. All rights reserved.
机译:使用二次离子质谱仪(SIMS)对铀浓缩设施的成分进行直接分析。制定了标准协议,可以从腐蚀的管件制备SIMS样品,而不会干扰腐蚀层。通过对230至280 amu的目标区域进行质量扫描,在腐蚀层中发现了独特的铀,氧和氟特征。这些特征确定腐蚀层的来源为六氟化铀(UF6)或相关的水解产物。腐蚀层的同位素分析确定了U-235 / U-238同位素比与具有天然U-的NIST可追溯标准品(CRM 112-A)相比,U-235的富集度达到0.0116 +/- 0.0019。 235 / U-238同位素比为0.007254 +/- 0.000004。 SIMS深度分析显示腐蚀层在同位素上均匀,深度约为23.5微米。在SIMS深度分析之前和之后进行光学轮廓测量,以测定腐蚀层18.5 keV O离子轰击的溅射速率为0.48 nm / s。所提供的数据是确凿的证据,表明SIMS深度分析可用于从铀浓缩组分中识别出新颖的核考古学特征,并对这些特征进行有意义的同位素分析。 (C)2014 Elsevier Ltd.保留所有权利。

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