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A new route toward light emission from Ge: tensile-strained quantum dots

机译:一个新的路线从通用电气对发光:tensile-strained量子点

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摘要

The tensile-strained Ge quantum dot (QD) is proposed as a new route for the realization of direct band gap conversion in Ge. Ge QDs were successfully grown on an InP substrate by molecular beam epitaxy. The strain field in the QDs were analyzed by high resolution transmission electron microscopy and simulated by the finite element method based on the measured geometries. The strain field in the QDs is found to be non-uniform and the shear component plays a significant role in the energy band structure, leading to larger required hydrostatic strain than that in the Ge thin films under biaxial strain to become a direct band gap.
机译:tensile-strained通用量子点(QD)提出了实现作为一个新的途径直接带隙在通用电气转换。成功种植在一个可使基质分子束外延。分析了量子点的高分辨率的传播电子显微镜和模拟的有限的基于测量的几何图形元素的方法。发现量子点的应变场不均匀的剪切组件中能带结构中的重要作用,导致更大的所需的静水压力在双轴比通用电气的薄膜压力成为一个直接带隙。

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