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Atomic Transport at Charged Graphene: Why Hydrogen and Oxygen Are So Different

机译:充电石墨烯的原子运输:为什么氢和氧如此不同

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Atoms on charged graphitic carbon surface are relevant to various electrochemical problems, understanding the adsorption and diffusion of adatoms under charging conditions is essential towards using graphene-like materials in electrochemistry. Using density functional calculations, we show that electron or hole doped graphene can strongly change the mobility of H and O adsorbed atoms. Interestingly, charge doping affects the diffusion of H and O in opposite ways, namely, electron doping increases/reduces, while hole doping reduces/increases the diffusion barrier of H/O respectively. Specifically, on neutral graphene the diffusion barriers of H and O are 1.01 and 0.74 eV, which are, upon a hole doping level of +5.9 3 1013 cm2, 0.77 and 0.90 eV, and upon an electron doping level of 5.9 3 1013 cm2, 1.36 and 0.38 eV. Thus, within the harmonic transition state theory, at room temperature, the diffusion rate of O can be decreased or increased by 470 or 1 3 106 times, while that of H can be increased or decreased by 1 3 104 or 7 3 105 times, respectively for the above hole or electron doping density. The difference between H and O atomic transport at charged graphene is interpreted in terms of the difference in geometric and bonding changes upon charge doping.
机译:带电的石墨碳表面上的原子与各种电化学问题有关,了解在充电条件下ADATOM的吸附和扩散对于在电化学中使用石墨烯样材料至关重要。使用密度函数计算,我们表明电子或孔掺杂石墨烯可以强烈改变H和O吸附原子的迁移率。有趣的是,电荷掺杂以相反的方式影响H和O的扩散,即电子掺杂增加/还原,而孔掺杂分别减小/增加了H/O的扩散屏障。具体而言,在中性石墨烯上,H和O的扩散屏障为1.01和0.74 eV,在孔掺杂水平为+5.9 3 1013 cm2、0.77和0.90 eV上,在电子掺杂水平上,5.9 3 1013 cm2, 1.36和0.38 ev。因此,在谐波过渡状态理论中,在室温下,O的扩散速率可以降低或增加470或1 3 106次,而H的扩散速率可以增加或减少1 3 104或7 3 105次,分别用于上述孔或电子掺杂密度。在电荷石墨烯时,H和O原子运输之间的差异是根据电荷掺杂时几何变化和粘结变化的差异来解释的。

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