首页> 外文期刊>Journal of solid state electrochemistry >Effect of the macro- and microthrowing power of the electrolyte on the uniformity of distribution of electroplated copper in through-holes for PCB
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Effect of the macro- and microthrowing power of the electrolyte on the uniformity of distribution of electroplated copper in through-holes for PCB

机译:电解液宏观和微观功率对PCB电镀孔电镀铜分布均匀性的影响

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This article studies the effect of macro- and microdistribution factors on the uniformity of electroplated copper coatings in through-holes of printed circuit boards. A computer program has been developed for simulating the primary potential distribution field and for calculating the local current densities for a two-dimensional model of electrodes with arbitrary shapes and mutual arrangement. The cross-sectional profile of a through-hole with a channel width equal to the hole diameter was taken as the two-dimensional model. A calculation of the primary potential distribution field predicts that the current density in wide through-holes decreases significantly and electroplating in narrow holes is nearly blocked. As the diameter of a through-hole decreases, the macrothrowing ability decreases in accordance with the decrease in the Wagner number, while the nonuniformity of the copper deposit thickness inside the holes increases, as confirmed by micrographs of cross sections of samples obtained in the electrolyte with and without a set of additives. The latter comprised leveling agents based on polyalkylene glycols and nitrogen-containing heterocyclic compounds, along with brightening organic sulfur-containing additives. Analysis of data on the distribution of copper on the cross sections of samples treated in stagnant electrolytes and with stirring, other conditions being equal, reveals a significant effect of uneven microdistribution in narrow holes. Addition of the set of leveling and brightening compounds to the electrolyte provides a small positive leveling power, which makes it possible to obtain uniform smooth coatings without a local thickness decrease at the orifice. The noticeable increase in the copper layer thickness in the middle of narrow holes in the presence of additives observed under conditions of diffusion limitations cannot be explained solely in terms of the effect of primary and secondary distribution. The effect of the increase in d(1/2) may be due to the depolarizing effect of the brightening sulfur-containing components of additives inside the holes.
机译:本文研究了宏观和微观分布因素对印制电路板通孔电镀铜层均匀性的影响。开发了一个计算机程序,用于模拟任意形状和相互排列的二维电极模型的初级电位分布场和计算局部电流密度。以通道宽度等于孔径的通孔的横截面轮廓作为二维模型。对一次电位分布场的计算表明,宽通孔中的电流密度显著降低,窄通孔中的电镀几乎被阻断。随着通孔直径的减小,宏观抛撒能力随着瓦格纳数的减小而降低,而孔内铜镀层厚度的不均匀性则增加,这一点可以通过添加和不添加添加剂的电解液中获得的样品横截面显微图得到证实。后者包括基于聚炔二醇和含氮杂环化合物的流平剂,以及增亮有机含硫添加剂。在其他条件相同的情况下,对在静止电解质和搅拌条件下处理的样品横截面上铜分布的数据进行分析,揭示了窄孔中微观分布不均匀的显著影响。向电解液中添加一组整平和增亮化合物可提供较小的正整平能力,这使获得均匀光滑的涂层成为可能,而孔口处的局部厚度不会减少。在存在扩散限制条件下观察到的添加剂的存在下,在窄孔的中间的铜层厚度的显著增加不能仅在初级和次级分布的影响方面解释。d(1/2)增加的效应可能是由于孔内添加剂的增亮含硫组分的去极化效应。

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