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首页> 外文期刊>Tribology International >Individual layer thickness-dependent nanoindentation and nanotribological behaviors of Ta/Co nanolaminates
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Individual layer thickness-dependent nanoindentation and nanotribological behaviors of Ta/Co nanolaminates

机译:TA / Co纳米胺的个体层厚度依赖性纳米凸缘和纳米型行为

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摘要

The nanohardness (H), reduced elastic modulus (E), and nanotribological properties including nanoscratch and nanowear resistance of tantalum/cobalt (Ta/Co) nanolaminates with varying individual layer thickness (h) were systematically studied using a nanoindenter. With decreasing individual layer thickness from 100 nm to 5 nm, the H of the nanolaminates increased gradually and reached a peak of similar to 7.20 GPa at h = 5 nm, while the E increased gradually with a sudden decrease at h = 25 nm. The critical point of delamination (P-c), coefficient of friction (COF), and post-scratch microstructures of the nanolaminates were assessed via nanoscratch testing. The normal load at P-c was increased gradually with a decrease in h under a ramped load. The post-scratch microstructures after delamination showed clear film chipping/crack formation and propagation of cracks/breakdown of grains at larger h, while no film chipping/cracking/breakdown of grains was observed in the nanolaminate with h = 5 nm. The wear rate of the nanolaminates increased with an increase in applied load irrespective of h and, interestingly, it started decreasing with increasing the numbers of wear cycles and became steady at higher numbers of wear cycles during nanowear tests. The nanolaminate with h = 5 nm showed the lowest wear rate with minimal plastic deformation. Nanoindentation of the worn surfaces of the nanolaminate with h = 5 nm after nanowear testing showed significant work hardening despite its negligible plastic deformation during nanowear tests. Overall, the Ta/Co nanolaminate with individual layer thickness at a few nanometers' length-scale exhibited high strength and excellent scratch and wear resistance with minimal plastic deformation.
机译:使用纳米压头系统地研究了不同单层厚度(H)的钽/钴(Ta/Co)纳米层压板的纳米硬度(H)、还原弹性模量(E)和纳米核糖性质,包括纳米裂纹和纳米耐磨性。随着单层厚度从100nm减小到5nm,纳米层压板的H逐渐增加,在H=5nm时达到类似于7.20GPa的峰值,而E逐渐增加,在H=25nm时突然降低。通过纳米裂纹测试评估了纳米层压板的分层临界点(P-c)、摩擦系数(COF)和划痕后微观结构。在倾斜载荷下,P-c处的正常载荷随着h的降低而逐渐增加。分层后的划痕后微观结构显示出清晰的薄膜剥落/裂纹形成和裂纹扩展/在较大h下的晶粒破裂,而在h=5 nm的纳米层压板中未观察到薄膜剥落/裂纹/晶粒破裂。纳米层压板的磨损率随着施加载荷的增加而增加,与h无关,有趣的是,随着磨损循环次数的增加,磨损率开始降低,并在纳米磨损试验期间在较高的磨损循环次数下变得稳定。h=5 nm的纳米层压板的磨损率最低,塑性变形最小。纳米磨损试验后,h=5 nm的纳米层压板磨损表面的纳米压痕显示出显著的加工硬化,尽管其在纳米磨损试验期间的塑性变形可以忽略不计。总的来说,Ta/Co纳米层压板具有几纳米长的单层厚度,在最小塑性变形的情况下表现出高强度和优异的耐刮擦和耐磨性。

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