首页> 外文期刊>The European physical journal, B. Condensed matter physics >Topological approach to quantum Hall effects and its important applications: higher Landau levels, graphene and its bilayer
【24h】

Topological approach to quantum Hall effects and its important applications: higher Landau levels, graphene and its bilayer

机译:拓扑霍尔效应的拓扑方法及其重要应用:较高的地兰水平,石墨烯及其双层

获取原文
获取原文并翻译 | 示例
           

摘要

In this paper the topological approach to quantum Hall effects is carefully described. Commensurability conditions together with proposed generators of a system braid group are employed to establish the fractional quantum Hall effect hierarchies of conventional semiconductors, monolayer and bilayer graphene structures. Obtained filling factors are compared with experimental data and a very good agreement is achieved. Preliminary constructions of ground-state wave functions in the lowest Landau level are put forward. Furthermore, this work explains why pyramids of fillings from higher bands are not counterparts of the well-known composite-fermion hierarchy - it provides with the cause for an intriguing robustness of nu = 7/3 , 8/3 and 5/2 states (also in graphene). The argumentation why paired states can be developed in two-subband systems (wide quantum wells) only when the Fermi energy lies in the first Landau level is specified. Finally, the paper also clarifies how an additional surface in bilayer systems contributes to an observation of the fractional quantum Hall effect near half-filling, nu = 1/2 .
机译:本文详细描述了量子霍尔效应的拓扑方法。利用可公度性条件和所提出的系统编织群生成器,建立了传统半导体、单层和双层石墨烯结构的分数量子霍尔效应层次结构。将得到的填充因子与实验数据进行了比较,得到了很好的一致性。提出了最低朗道能级基态波函数的初步构造。此外,这项工作解释了为什么来自更高波段的填充物金字塔不是众所周知的复合费米子体系的对应物——它为nu=7/3、8/3和5/2态(同样在石墨烯中)的耐用性提供了一个有趣的原因。阐明了为什么只有当费米能量位于第一朗道能级时,才能在两个子带系统(宽量子阱)中发展成对态。最后,本文还阐明了双层体系中的附加表面如何有助于观察半填充附近的分数量子霍尔效应,nu=1/2。

著录项

相似文献

  • 外文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号