首页> 外文期刊>Plasma Science & Technology >Experimental investigation of the electromagnetic effect and improvement of the plasma radial uniformity in a large-area, very-high frequency capacitive argon discharge
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Experimental investigation of the electromagnetic effect and improvement of the plasma radial uniformity in a large-area, very-high frequency capacitive argon discharge

机译:电磁效应的实验研究和大面积高频电容氩气放电中等离子径向均匀性的实验研究

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摘要

We performed an experimental investigation on the electromagnetic effect and the plasma radial uniformity in a larger-area, cylindrical capacitively coupled plasma reactor. By utilizing a floating hairpin probe, dependences of the plasma radial density on the driving frequency and the radio-frequency power over a wide pressure range of 5-40 Pa were presented. At a relatively low frequency (LF, e.g. 27 MHz), an evident peak generally appears near the electrode edge for all pressures investigated here due to the edge field effect, while at a very high frequency (VHF, e.g. 60 or 100 MHz), the plasma density shows a sharp peak at the discharge center at lower pressures, indicating a strong standing wave effect. As the RF power increases, the center-peak structure of plasma density becomes more evident. With increasing the pressure, the standing wave effect is gradually overwhelmed by the 'stop band' effect, resulting in a transition in the plasma density profile from a central peak to an edge peak. To improve the plasma radial uniformity, a LF source is introduced into the VHF plasma by balancing the standing wave effect with the edge effect. A much better plasma uniformity can be obtained if one chooses appropriate LF powers, pressures and other corresponding discharge parameters.
机译:我们在大面积圆柱形电容耦合等离子体反应器中对电磁效应和等离子体径向均匀性进行了实验研究。利用浮动发夹探针,在5-40pa的大气压范围内,给出了等离子体径向密度与驱动频率和射频功率的关系。在相对较低的频率(LF,例如27 MHz)下,由于边缘场效应,此处研究的所有压力的明显峰值通常出现在电极边缘附近,而在非常高的频率(VHF,例如60或100 MHz)下,在较低的压力下,等离子体密度在放电中心显示出一个尖峰,表明存在强烈的驻波效应。随着射频功率的增加,等离子体密度的中心-峰值结构变得更加明显。随着压力的增加,驻波效应逐渐被“阻带”效应淹没,导致等离子体密度分布从中心峰向边缘峰转变。为了改善等离子体的径向均匀性,通过平衡驻波效应和边缘效应,在VHF等离子体中引入低频源。如果选择合适的低频功率、压力和其他相应的放电参数,可以获得更好的等离子体均匀性。

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  • 来源
    《Plasma Science & Technology》 |2021年第5期|共9页
  • 作者单位

    Beijing Inst Control Engn Lab Adv Space Prop Beijing 100190 Peoples R China;

    Dalian Univ Technol Sch Phys Minist Educ Key Lab Mat Modificat Laser Ion &

    Electron Beams Dalian 116024 Peoples R China;

    Dalian Univ Technol Sch Phys Minist Educ Key Lab Mat Modificat Laser Ion &

    Electron Beams Dalian 116024 Peoples R China;

    Dalian Univ Technol Sch Phys Minist Educ Key Lab Mat Modificat Laser Ion &

    Electron Beams Dalian 116024 Peoples R China;

    Dalian Univ Technol Sch Phys Minist Educ Key Lab Mat Modificat Laser Ion &

    Electron Beams Dalian 116024 Peoples R China;

    Dalian Univ Technol Sch Phys Minist Educ Key Lab Mat Modificat Laser Ion &

    Electron Beams Dalian 116024 Peoples R China;

  • 收录信息
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 物理学;
  • 关键词

    electromagnetic effect; plasma radial uniformity; very-high-frequency capacitively coupled plasmas;

    机译:电磁效果;等离子体径向均匀性;非常高频率电容耦合等离子体;

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