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Method to Improve Initial Azimutal Uniformity of a Current Shell in Devices with a Plasma Focus

机译:提高具有等离子体焦点在设备中当前壳体的初始壳体均匀性的方法

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In a device with a plasma focus, the possibility of improving the initial azimuthal uniformity of the current plasma shell is realized by enhancing the stabilizing action of the skin effect at an increase in the initial rate of the discharge current rise. An additional current source is used, which is switched on before the operation of the vacuum discharger triggering the capacitor bank. The source creates a breakdown along the insulator in the discharge chamber and a rise in current with a high initial rate, which cannot be provided in the devices with a traditional circuit of switching by a vacuum discharger, immediately after the breakdown. The use of an additional current source in the test experiments made it possible to increase the working pressure of deuterium in the chamber more than by a factor of three and significantly increase the stability of the device. It is shown that when an additional current source is switched on, an azimuthally uniform current plasma shell with a sufficiently high degree of ionization is formed in the discharge chamber, and it excludes the development of large-scale current perturbations during a subsequent flow across the shell of a growing discharge current in the capacitor bank.
机译:在具有等离子体聚焦的装置中,通过在放电电流初始上升速率增加时增强趋肤效应的稳定作用来实现改善当前等离子体外壳的初始方位均匀性的可能性。使用一个额外的电流源,该电流源在真空放电装置触发电容器组之前打开。该电源沿放电室中的绝缘体产生击穿,并以较高的初始速率增加电流,这在击穿后立即由真空放电器切换的传统电路中是无法提供的。在测试实验中使用额外的电流源,可以将腔室中氘的工作压力提高三倍以上,并显著提高装置的稳定性。结果表明,当额外的电流源被打开时,放电室中会形成一个具有足够高电离度的方位均匀电流等离子体壳,并且在随后流经电容器组中不断增加的放电电流的壳的过程中,它排除了大规模电流扰动的发展。

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