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Scaling analysis of the low temperature conductivity in neutron-transmutation-doped Ge-70 : Ga

机译:掺杂中子的Ge-70:Ga的低温电导率的尺度分析

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摘要

We report on the scaling analysis of low temperature electron transport properties of nominally uncompensated neutron-transmutation-doped Ge-70:Ga samples in the critical regime for the metal-insulator transition. Ga concentration (N) and temperature (T) dependent conductivities sigma(N,T) are shown to collapse onto a single universal curve using finite temperature scaling of a form sigma(N,T) proportional to T-x f(N/N-c - 1/T-y) with x approximate to 0.38 and y approximate to 0.32 for the very small region of N = N-c +/- 0.004N(c). The conductivity critical exponent mu = x/y = 1.2 +/- 0.2 found from this analysis is significantly larger than mu approximate to 0.5 found from the analysis we performed previously on the same series of samples covering the much larger region of the concentration N-c < N < 1.4N(c). Determination of the true critical region, either N = N-c +/- 0.4% or N = N-c +/- 40%, is necessary in the future for the reliable determination of mu in Ge:Ga. [References: 23]
机译:我们报告了标称未补偿的中子regime杂的Ge-70:Ga样品在金属-绝缘体转变的临界状态下的低温电子传输性能的尺度分析。 Ga浓度(N)和温度(T)依赖的电导率sigma(N,T)显示为使用与Tx f( N / Nc-对于N = Nc +/- 0.004N(c)的很小区域,x近似为0.38,y近似为0.32。从该分析中发现的电导率临界指数mu = x / y = 1.2 +/- 0.2大大大于从我们先前对覆盖更大浓度范围Nc < N <1.4N(c)。为了可靠地确定Ge:Ga中的mu,将来有必要确定真正的临界区,N = N-c +/- 0.4%或N = N-c +/- 40%。 [参考:23]

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