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Computational simulation of redox reactions within a metal electrospray emitter

机译:金属电喷雾发射器中氧化还原反应的计算模拟

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A computational simulation of the oxidation of chemical species inside a metal emitter electrospray ion source, in the context of electrospray mass spectrometry (ES-MS), has been developed. The analysis code employs a boundary integral method for the solution of the Laplace equation for the electric potential and current and incorporates standard activation and concentration polarization functions for the redox-active species in the system to define the boundary conditions. This paper provides a demonstration of the capability of this simulation method. Due to the approximate nature of some of the input data, and certain simplifying assumptions, the present results must be considered semiquantitative, The specific system modeled consisted of a 100-mu m-i.d., inert metal capillary ES emitter and a spray solution composed of an analyte dissolved in CH3CN/H2O (90/10 v/v), Variable parameters included the concentration (i.e., 5.0, 10, 20, and 50 mu M) of the easily oxidized analyte ferrocene (Fc, dicyclopentadienyl iron) in the solution, and solution conductivities of 1.9, 3.8, and 7.6 x 10(-7) Omega(-1)/cm, with an operational flow rate of 5.0 mu L/min and ES currents on the order of 0.05 mu A. Under these defined conditions, the two most prominent reactions at the emitter metal/ solution interface were assumed to be H2O oxidation (2H(2)O = O-2 + 4H(+-) + 4e(-)) and ferrocene oxidation (Fc Fc(+) + e(-)). Using this model, it was possible to predict the interfacial potentials, as well as the current density for each of the reactions, as a function of axial position from the emitter spray tip back upstream, under the various operational conditions. The simulations show that the majority of the current from the redox reactions is generated within a 200-300-mu m region near the spray tip. The lower the value of E-0 for a specific reaction, the further upstream from the tip the reaction extends. [References: 34]
机译:在电喷雾质谱(ES-MS)的背景下,已经开发了金属发射器电喷雾离子源内部化学物质氧化的计算模拟。该分析代码采用边界积分法求解电势和电流的拉普拉斯方程,并为系统中的氧化还原活性物质引入标准激活和浓度极化函数,以定义边界条件。本文提供了这种仿真方法功能的演示。由于某些输入数据的近似性质以及某些简化的假设,因此必须将当前结果视为半定量的。所建模的特定系统由100微米mi.d.惰性金属毛细管ES发射器和喷雾溶液组成,溶于CH3CN / H2O(90/10 v / v)的分析物,可变参数包括易氧化的二茂铁(Fc,二环戊二烯基铁)中易氧化的分析物二茂铁(Fc,二环戊二烯基铁)的浓度(即5.0、10、20和50μM)。溶液,溶液电导率分别为1.9、3.8和7.6 x 10(-7)Omega(-1)/ cm,工作流速为5.0μL / min,ES电流为0.05μA。在确定的条件下,发射极金属/溶液界面上两个最显着的反应被假定为H2O氧化(2H(2)O = O-2 + 4H(+-)+ 4e(-))和二茂铁氧化(Fc Fc( +)+ e(-))。使用此模型,可以预测在各种操作条件下,界面势以及每个反应的电流密度,取决于从喷射器喷嘴返回上游的轴向位置。模拟表明,氧化还原反应产生的大部分电流是在靠近喷嘴的200-300微米区域内产生的。特定反应的E-0值越低,反应延伸到尖端的上游越远。 [参考:34]

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