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Fabrication of nanoscale gold disk electrodes using ultrashort pulse etching

机译:使用超短脉冲刻蚀制备纳米级金盘电极

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摘要

A novel method for preparing a nanometer-sized gold disk electrode is described. The electrode was fabricated by electrochemical etching of a gold wire, insulating the etched wire with a varnish with the exception of the apex, and cutting down the apex by applying ultrashort (40 ns) etching pulses in an HCl solution. Cyclic voltammograms of a 0.10 M ferrocyanide solution recorded at the electrode showed that a series of etching pulses gradually reduced the diffusion-limited current at the electrode by etching its apex. Characterization by cyclic voltammetry and scanning electron microscopy revealed the transformation of a cone-shaped apex into a disk-shaped electrode with a radius of typically between 50 and 250 nm. [References: 25]
机译:描述了一种制备纳米级金盘电极的新颖方法。电极的制作方法是:对金线进行电化学蚀刻,将蚀刻后的导线用除顶点以外的清漆绝缘,然后在HCl溶液中施加超短(40 ns)的蚀刻脉冲来切断顶点。在电极上记录的0.10 M亚铁氰化物溶液的循环伏安图显示,一系列蚀刻脉冲通过蚀刻电极的顶点逐渐减小了电极上的扩散限制电流。通过循环伏安法和扫描电子显微镜的表征显示,圆锥形顶点转变为半径通常在50至250 nm之间的圆盘形电极。 [参考:25]

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