机译:通过等离子体增强原子层沉积,具有均匀氮气掺杂谱的Heal-Moxion薄膜的低温一步生长
Fudan Univ Sch Microelect Shanghai Inst Intelligent Elect &
Syst State Key Lab ASIC &
Syst Shanghai 200433 Peoples R China;
Fudan Univ Sch Microelect Shanghai Inst Intelligent Elect &
Syst State Key Lab ASIC &
Syst Shanghai 200433 Peoples R China;
Fudan Univ Sch Microelect Shanghai Inst Intelligent Elect &
Syst State Key Lab ASIC &
Syst Shanghai 200433 Peoples R China;
Chinese Acad Sci Inst Semicond Key Lab Semicond Mat Sci Beijing 100083 Peoples R China;
Fudan Univ Sch Microelect Shanghai Inst Intelligent Elect &
Syst State Key Lab ASIC &
Syst Shanghai 200433 Peoples R China;
Fudan Univ Sch Microelect Shanghai Inst Intelligent Elect &
Syst State Key Lab ASIC &
Syst Shanghai 200433 Peoples R China;
Fudan Univ Sch Microelect Shanghai Inst Intelligent Elect &
Syst State Key Lab ASIC &
Syst Shanghai 200433 Peoples R China;
Fudan Univ Sch Microelect Shanghai Inst Intelligent Elect &
Syst State Key Lab ASIC &
Syst Shanghai 200433 Peoples R China;
aluminum oxynitride(AlON); plasma-enhanced atomic layer deposition (PEALD); doping profile; X-ray photoelectron spectroscopy; interface;
机译:通过等离子体增强原子层沉积,具有均匀氮气掺杂谱的Heal-Moxion薄膜的低温一步生长
机译:通过等离子体增强原子层沉积自限低温生长晶体AlN薄膜
机译:等离子增强原子层沉积法低温自限生长III族氮化物薄膜
机译:等离子体增强原子层沉积和扩散阻挡特性在钽薄膜上的生长
机译:用于多功能薄膜电子设备的等离子增强原子层沉积氧化锌。
机译:等离子体增强原子层沉积在低温下沉积的HfO2薄膜的结构光学和电学性质
机译:通过等离子增强原子层沉积自限低温生长晶体AlN薄膜
机译:二元和三元氧化物薄膜原子层外延低温沉积过程的研究