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首页> 外文期刊>ACS applied materials & interfaces >Mechanisms of LiCoO2 Cathode Degradation by Reaction with HF and Protection by Thin Oxide Coatings
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Mechanisms of LiCoO2 Cathode Degradation by Reaction with HF and Protection by Thin Oxide Coatings

机译:通过与HF反应和薄氧化物涂料的反应,LiCoO2阴极降解的机制

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摘要

Reactions of HF with uncoated and Al and Zn oxide-coated surfaces of LiCoO2 cathodes were studied using density functional theory. Cathode degradation caused by reaction of HF with the hydroxylated (10T4) LiCoO2 surface is dominated by formation of H2O and a LiF precipitate via a barrierless reaction that is exothermic by 1.53 eV. We present a detailed mechanism where HF reacts at the alumina coating to create a partially fluorinated alumina surface rather than forming AlF3 and H2O and thus alumina films reduce cathode degradation by scavenging HF and avoiding H2O formation. In contrast, we find that HF etches monolayer zinc oxide coatings, which thus fail to prevent capacity fading. However, thicker zinc oxide films mitigate capacity loss by reacting with HF to form a partially fluorinated zinc oxide surface. Metal oxide coatings that react with HF to form hydroxyl groups over H2O, like the alumina monolayer, will significantly reduce cathode degradation.
机译:利用密度函数理论研究了HF与无涂覆和Al和Zn氧化涂层的LiCoO 2阴极涂覆表面的反应。 通过HF与羟基化(10T4)LiCoO 2的反应引起的阴极降解通过形成H 2 O和LiF沉淀而导致的,通过禁止反应将其放热至1.53eV。 我们介绍了一种详细的机理,其中HF在氧化铝涂层中反应以产生部分氟化的氧化铝表面而不是形成AlF 3和H 2 O,因此通过清除HF并避免H 2 O形成,氧化铝膜降低阴极降解。 相比之下,我们发现HF蚀刻单层氧化锌涂层,因此不能防止容量衰落。 然而,通过与HF反应形成部分氟化的氧化锌表面,厚氧化锌膜较厚的氧化锌膜减轻了容量损失。 与HF反应以在H 2 O中形成羟基的金属氧化物涂层,如氧化铝单层,将显着降低阴极降解。

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