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Doping of MoTe2 via Surface Charge Transfer in Air

机译:通过表面电荷转移在空气中掺杂Mote2

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Doping is a key process by which the concentration and type of majority carriers can be tuned to achieve desired conduction properties. The common way of doping is via bulk impurities, as in the case of silicon. For van der Waals bonded semiconductors, control over bulk impurities is not as well developed, because they may either migrate between the layers or bond with the surfaces or interfaces becoming undesired scattering centers for carriers. Herein, we investigate by means of Kelvin probe force microscopy (KPFM) and density functional theory calculations (DFT) the doping of MoTe2 via surface charge transfer occurring in air. Using DFT, we show that oxygen molecules physisorb on the surface and increase its work function (compared to pristine surfaces) toward p-type behavior, which is consistent with our KPFM measurements. The surface charge transfer doping (SCTD) driven by adsorbed oxygen molecules can be easily controlled or reversed through thermal annealing of the entire sample. Furthermore, we also demonstrate local control of the doping by contact electrification. As a reversible and controllable nanoscale physisorption process, SCTD can thus open new avenues for the emerging field of 2D electronics.
机译:掺杂是可以调整多个载体的浓度和类型以实现所需的传导性能的关键方法。掺杂的常用方式是通过堆积杂质,如硅的情况下。对于van der Wa键合粘合的半导体,对散装杂质的控制不起作用,因为它们可以在层之间迁移或与表面或界面之间的粘合成为载体的不希望的散射中心。在此,我们借助于开尔文探针显微镜(KPFM)和密度泛函理论计算(DFT)通过在空气中发生的表面电荷转移掺杂Mote2的掺杂。使用DFT,我们展示了氧气分子在表面上产生并增加其与P型行为的工作功能(与原始表面相比),这与我们的KPFM测量一致。通过吸附的氧分子驱动的表面电荷转移掺杂(SCTD)可以通过整个样品的热退火容易地控制或逆转。此外,我们还通过接触电气展示了掺杂的局部控制。作为可逆和可控的纳米级理由工艺,因此SCTD可以为2D电子的新兴领域开辟新的途径。

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