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Te-Vacancy-Induced Surface Collapse and Reconstruction in Antiferromagnetic Topological Insulator MnBi2Te4

机译:防铁磁性拓扑绝缘体Mnbi2te4中的Te空缺诱导的表面塌陷和重建

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MnBi_(2)Te_(4) is an antiferromagnetic topological insulator that has stimulated intense interest due to its exotic quantum phenomena and promising device applications. The surface structure is a determinant factor to understand the magnetic and topological behavior of MnBi_(2)Te_(4), yet its precise atomic structure remains elusive. Here we discovered a surface collapse and reconstruction of few-layer MnBi_(2)Te_(4) exfoliated under delicate protection. Instead of the ideal septuple-layer structure in the bulk, the collapsed surface is shown to reconstruct as a Mn-doped Bi_(2)Te_(3) quintuple layer and a Mn_(x )Bi_(y )Te double layer with a clear van der Waals gap in between. Combined with first-principles calculations, such surface collapse is attributed to the abundant intrinsic Mn–Bi antisite defects and the tellurium vacancy in the exfoliated surface, which is further supported by in situ annealing and electron irradiation experiments. Our results shed light on the understanding of the intricate surface-bulk correspondence of MnBi_(2)Te_(4) and provide an insightful perspective on the surface-related quantum measurements in MnBi_(2)Te_(4) few-layer devices.
机译:MNBI_(2)TE_(4)是一种反铁磁性拓扑绝缘体,其由于其异乎寻常的量子现象和有前途的装置应用而受到刺激的兴趣。表面结构是了解MNBI_(2)TE_(4)的磁性和拓扑行为的决定因素,但其精确的原子结构仍然难以捉摸。在这里,我们发现了在微妙保护下剥离的几层MNBI_(2)TE_(4)的表面塌陷和重建。代替体积中的理想偏见层结构,折叠表面被示出为MN掺杂的Bi_(2)TE_(3)Quintuple层和Mn _( x)Bi _( Y)。 TE双层与van der waals之间的差距。结合第一原理的计算,这种表面塌陷归因于剥落表面的丰富内在的Mn-Bi抗腐蚀缺陷和碲空间,其通过在原位退火和电子照射实验中进一步支持。我们的结果阐明了了解MNBI_(2)TE_(4)的复杂表面批量对应关系,并在MNBI_(2)TE_(4)几个层装置中的表面相关量子测量中提供了富有识别的视角。

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