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首页> 外文期刊>Chemical Physics Letters >Electronic properties of h-BN/g-C2N van der Waals heterojunction: A first-principles calculation
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Electronic properties of h-BN/g-C2N van der Waals heterojunction: A first-principles calculation

机译:H-BN / G-C2N van der Waals异质结的电子特性:一个第一原理计算

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摘要

The structural and electronic properties of a heterojunction made of hexagonal boron nitride (h-BN) and g-C2N have been investigated by first-principles calculations involving the weak van der Waals (vdW) interaction described by the Grimme approach. It is found that the h-BN/g-C2N heterojunction is a typical type-II heterojunction with a direct band gap around 0.80 eV. The atomic projected density of states and the band-decomposed charge densities have demonstrated that the valence band maximum (VBM) and conduction band minimum (CBM) of the h-BN/g-C2N heterojunction are mainly provided by h-BN and g-C2N, respectively. Moreover, we find that the changes of band gap are very small for large variations of the vertical interlayer distance between h-BN and g-C2N. Our results indicate the great potential application in Li-ion battery and electronic device due to the large variation of interlayer distance induced by ion insertion or vertical strains for h-BN/g-C2N heterojunction.
机译:通过通过GRIMME方法描述的弱van der waals(Vdw)相互作用的一致性计算,研究了由六边形氮化硼(H-Bn)和G-C2N制成的异质结的结构和电子性质。 发现H-BN / G-C2N异质结是典型的II型异质结,其直接带隙约为0.80eV。 状态的原子预测密度和带分解的电荷密度已经证明了H-BN / G-C2N异质结的价值波浪最大(VBM)和导通带的最小(CBM)主要由H-BN和G-提供 C2N分别。 此外,我们发现带隙的变化非常小,对于H-BN和G-C2N之间的垂直层间距离的大变化非常小。 我们的结果表明,由于H-BN / G-C2N异质结的离子插入或垂直菌株引起的层间距离的大变化,锂离子电池和电子器件中的巨大潜在应用。

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