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首页> 外文期刊>CERAMICS INTERNATIONAL >The effect of current density on the composition, structure, morphology and optical properties of galvanostatically electrodeposited nanostructured cadmium telluride films
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The effect of current density on the composition, structure, morphology and optical properties of galvanostatically electrodeposited nanostructured cadmium telluride films

机译:电流密度对镀锌电沉积纳米结构镉碲化镉磷酸镉的组成,结构,形态和光学性质的影响

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摘要

Cadmium telluride (CdTe) films were electrodeposited galvanostatically on fluorine doped tin oxide (FTO) substrates at various applied current densities. The electrodeposited films were characterized using X-ray diffraction spectroscopy (XRD), scanning electron microscopy (SEM) and optical absorption spectroscopy techniques. The results showed that amount of cadmium in the deposited films were enhanced by increasing the applied current density. It was observed that an applied current density of 18 mA/cm(2) produced Cd:Te films with 1:1 stoichiometry. Moreover, the maximum optical absorption and the closest band gap value to the expected one for CdTe (1.45 ev) were observed in the case of stoichiometric films which had less porosity and larger crystallite size among the films that were electrodeposited at applied current densities other than the optimum value. In addition, those films that were heat treated had less porosity in their structure, larger crystallite size and less band gap energy compared to the films without heat treatment.
机译:碲化镉(CDTE)薄膜在各种施加的电流密度下在氟掺杂的氧化锡(FTO)基材上被电沉积电涂覆的镀锌。使用X射线衍射光谱(XRD),扫描电子显微镜(SEM)和光学吸收光谱技术表征电沉积的薄膜。结果表明,通过增加施加的电流密度来提高沉积膜中的镉的量。观察到施加的电流密度为18mA / cm(2)产生的CD:Te膜,其中化学计量为1:1。此外,在化学计量薄膜的情况下观察到用于CDTE(1.45eV)的最大光学吸收和最接近的带隙值对CDTE(1.45eV)的情况下观察到在施加的电流密度的薄膜中具有较少的孔隙率和较大的微晶尺寸。最佳值。另外,与没有热处理的薄膜相比,热处理的那些热处理的孔隙率较小,较大的微晶尺寸和较少的带隙能量。

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