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Effect of the microstructures of yttria ceramics on their plasma corrosion behavior

机译:Yttria陶瓷微观结构对等离子体腐蚀行为的影响

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To demonstrate the relation between the microstructure of ceramics and their plasma corrosion behavior, sintered yttria (Y2O3) ceramics with various grain sizes and porosities were fabricated under various sintering conditions, and the effect of the microstructures of the Y2O3 ceramics on their plasma corrosion behavior was investigated. The Y2O3 samples were investigated by inductively coupled plasma reactive ion etching using fluorine plasma. After plasma exposure, the plasma corrosion depth and surface roughness (Sa) values of the materials were measured using a laser scanning microscope. The surface microstructures after plasma corrosion were observed by scanning electron microscopy. It was found that the plasma depth showed an almost lines change with plasma exposure time, and all the original surfaces of the samples were corroded by over 0.7 mu m during plasma exposure for 60 min. The Sa values of the Y2O3 samples as a result of plasma exposure wet significantly different in that although the Sa values of low-density Y2O3 samples increased with an increase in the plasma exposure time, the values of their high-density counterparts did not change and the initial surface roughness was maintained. The fluorine plasma was found to homogeneously corrode the surfaces of the sintered Y2O3 ceramics, regardless of their grain boundaries or grain sizes. However, when internal pores were present in the samples, these internal pores were selectively corroded from their edges, becoming crater-like plasma corrosion marks. Overall, a high-density Y2O3 ceramic was found, which retained its initial surface roughness regardless of plasma exposure time, with an ideal microstructure for use as a plasma-resistant ceramic material that can be used as the inner ceramic components in the plasma etching equipment.
机译:为了证明陶瓷的微观结构与其等离子体腐蚀行为之间的关系,在各种烧结条件下制造具有各种晶粒尺寸和孔隙孔的烧结ytTria(Y2O3)陶瓷,并且Y2O3陶瓷微观结构对其等离子体腐蚀行为的影响是调查。通过使用氟血浆通过电感耦合的等离子体反应离子蚀刻研究了Y2O3样品。在血浆曝光后,使用激光扫描显微镜测量材料的等离子体腐蚀深度和表面粗糙度(SA)值。通过扫描电子显微镜观察等离子体腐蚀后的表面微观结构。发现等离子体深度显示出血浆暴露时间几乎曲线变化,并且在等离子体暴露期间,样品的所有原始表面腐蚀了60分钟。由于血浆曝光的结果,Y2O3样品的SA值显着不同,因为虽然低密度Y2O3样品的SA值随着等离子体暴露时间的增加而增加,但它们的高密度对应物的值没有变化保持初始表面粗糙度。发现氟血浆均匀地腐蚀烧结的Y2O3陶瓷的表面,无论它们的晶界还是晶粒尺寸如何。然而,当样品中存在内部孔时,这些内部孔选择性地从它们的边缘腐蚀,成为陨石坑状等离子体腐蚀标记。总体而言,发现高密度Y2O3陶瓷,其保留其初始表面粗糙度,无论等离子体暴露时间如何,具有理想的微观结构,用作等离子体抗性陶瓷材料,可用作等离子体蚀刻设备中的内陶瓷组件。

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