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Reduced leakage current, enhanced ferroelectric and dielectric properties in Mn-doped BiFeO3 thin film composited with TiO2 layers

机译:用TiO2层组合的Mn掺杂BifeO3薄膜中降低漏电流,增强的铁电和介电性能

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摘要

The 2 mol% Mn-doped Bi1.05FeO3 (abbreviated as BFOMn, S0), BFOMn composited films with TiO2 layer at the surface of BFOMn (S1), and on the interface between BFOMn film and substrate (S2), as well as at the both sides of the BFOMn film (S3) were prepared on indium tin oxide (ITO)/glass substrates through a chemical solution deposition process. The effects of TiO2 layers deposited at different positions on microstructure, insulating, ferroelectric and dielectric performances are fully investigated. The crystallized perovskite structures without any secondary phases are well maintained in all samples. Increased grain sizes can be achieved with the introduction of TiO2. Among these films, S3 has large average grain size and possesses decreased leakage current density of 7.2 x 10(-5) A/cm(2) under 400 kV/cm, relatively large remanent polarization (P-r) value of 82.3 mu C/cm(2) under 3333 kV/cm at 10 kHz, larger dielectric constant (similar to 330) and smaller dissipation factor (similar to 0.04) at 100 kHz. These results demonstrate that introducing TiO2 layers into appropriate positions can be a feasible way to improve the microstructure and enhance the electrical properties of BFO-based films.
机译:2mol%Mn掺杂的Bi1.05FeO 3(缩写为BFOMN,S0),BFOMN在BFOMN表面的TiO2层组成的膜(S1),以及BFOMN膜和基板之间的界面(S2),以及AT通过化学溶液沉积工艺在氧化铟锡(ITO)/玻璃基板上制备BFOMN膜(S3)的两侧。全面研究了在不同位置沉积在微结构,绝缘,铁电和介电性能下沉积的TiO2层的影响。在所有样品中,没有任何二次相的结晶钙钛矿结构很好地维持。通过引入TiO2可以实现增加的粒度。在这些薄膜中,S3具有大的平均晶粒尺寸,并且具有在400kV / cm的漏电流密度为7.2×10(-5)A / cm(2)的漏电流密度下降,相对大的熔化极化(PR)值为82.3μc/ cm (2)在10kHz的3333 kV / cm下,较大介电常数(类似于330),较小的耗散因子(类似于0.04),在100kHz。这些结果表明,将TiO2层引入适当的位置可以是改善微观结构的可行方式,并增强基于BFO的膜的电性能。

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