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Synthesis of NiMn2O4 thin films via a simple solid-state reaction route

机译:通过简单的固态反应途径合成Nimn2O4薄膜

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摘要

Herein, NiMn2O4 (MNO) spinel oxide thermistor films were synthesized on a SiO2/Si substrate via annealing the electron beam evaporated Mn-Ni-Mn metal trilayers in air at different temperatures. The X-ray diffraction (XRD) results indicate that polycrystalline spinel-structured MNO thermistor films were formed. The surface particle size of the series MNO films quickly reduced from similar to 300 to similar to 120 nm with a temperature increase from 650 to 750 degrees C, and then, slowly reduced to 80 nm or even smaller with a temperature increase from 750 to 950 degrees C. Specifically, 750 degrees C anneal formed the spinel MNO film with largest B value of 5067 and Ea value of 0.4366. The proposed synthesis route for MNO spinel oxide film has been proven to be feasible.
机译:在此,通过退火在SiO 2 / Si衬底上在不同温度下的空气中的电子束蒸发的Mn-Ni-Mn金属三层在SiO 2 / Si衬底上合成NiMn 2 O 4(MNO)尖晶石热敏电阻膜。 X射线衍射(XRD)结果表明形成多晶尖晶石结构MnO热敏电阻膜。 系列MnO膜的表面粒度从相似的300℃迅速降低到120nm,温度从650升至750℃,然后,从750到950的温度升高,缓慢降至80nm或甚至更小。 具体地,750℃退火形成尖晶石MnO膜,最大B值为5067,EA值为0.4366。 已经证明了MnO尖晶石氧化膜的所提出的合成途径是可行的。

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