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首页> 外文期刊>CERAMICS INTERNATIONAL >Self-assembly preparation of popcorn-like colloidal silica and its application on chemical mechanical polishing of zirconia ceramic
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Self-assembly preparation of popcorn-like colloidal silica and its application on chemical mechanical polishing of zirconia ceramic

机译:爆米花胶体二氧化硅的自组装制备及其对氧化锆陶瓷化学机械抛光的应用

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摘要

Traditional mobile phone backplane materials are difficult to meet the requirements of the 5G era, and zirconia ceramic is one of the most promising backplane materials. However, its precision machining is difficult due to the hard and brittle nature. In this work, a novel popcorn-like colloidal silica was prepared by the self-assembly growth of nanoparticles for chemical mechanical polishing of the yttria-stabilized tetragonal zirconia ceramic sheets. The surface of the popcorn-like colloidal silica particles has a noticeably uneven shape, and the particle size distribution is uniform. The chemical mechanical polishing results show that the material removal rate of the prepared popcorn-like colloidal silica is increased by about 50% compared with the spherical colloidal silica, and the surface morphology is also obtained improvement. In the process of chemical mechanical polishing, the particles form multi-point contact with the ceramic sheet, resulting in an increase in the coefficient of friction, which is beneficial to the tribochemical reaction. In addition, multi-point contact can distribute the load, make the indentation shallower, and help reduce mechanical scratches. In general, the expected results are expected to provide experimental basis for the optimization of the structure of chemical mechanical polishing abrasive particles.
机译:传统的手机背板材料难以满足5G时代的要求,氧化锆陶瓷是最有前途的背板材料之一。然而,由于硬性和脆性的性质,其精密加工难以。在这项工作中,通过纳米颗粒的自组装生长来制备新的爆米花样胶体二氧化硅,用于氧化钇稳定的四方氧化锆陶瓷片的化学机械抛光。爆米花状胶体二氧化硅颗粒的表面具有明显不均匀的形状,粒度分布是均匀的。化学机械抛光结果表明,与球形胶体二氧化硅相比,制备的爆米花状胶体二氧化硅的材料去除率增加了约50%,并且还得到了改善的表面形态。在化学机械抛光过程中,颗粒与陶瓷片形成多点接触,导致摩擦系数增加,这对培养学反应有益。此外,多点触点可以分配负载,使压痕浅,并有助于减少机械划痕。通常,预期结果预计将为优化化学机械抛光磨料颗粒结构提供实验依据。

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