A small-dimensional microwave plasma unit with a rectangular resonator

摘要

Constructive peculiarities and technical characteristics of multifunctional small-dimensional plasma unit for material treatment are given. The unit is intended for rough plasmachemical treatment of microelectronic, electronic, optic, etc. devices. For example, the unit provides threefold energy reduce while photoresist removing in relation to one Φ100 mm silicon wafer with simultaneous treatment acceleration 2-3 folds in comparison with industrial unit "Plasma-600T".