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Estimation and compensation of process-induced variations in capacitors for improved reliability in integrated circuits

机译:估计和补偿电容器中过程引起的变化,以提高集成电路的可靠性

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摘要

This paper describes a method for the estimation of capacitor process variations in integrated circuits and for the subsequent compensation of such variations through a calibration scheme that exploits a variable capacitor bank. An architecture for the calibration circuit is proposed, and various problems that arise during implementation are discussed. The design consists of an oscillator whose output frequency is inversely proportional to the capacitor value and simple state machine for measurement of capacitor process variations. The design of optimum capacitor bank is described together with the adequate tuning plan. The circuit is fabricated and verified in 130 nm RF CMOS process and can be easily scaled to sub-100-nm technologies.
机译:本文介绍了一种用于估算集成电路中电容器工艺变化并随后通过采用可变电容器组的校准方案来补偿此类变化的方法。提出了用于校准电路的架构,并讨论了在实现过程中出现的各种问题。该设计包括一个振荡器,其输出频率与电容器的值成反比;以及一个简单的状态机,用于测量电容器的工艺变化。描述了最佳电容器组的设计以及适当的调整计划。该电路采用130 nm RF CMOS工艺制造和验证,可以轻松扩展至100 nm以下技术。

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