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Mechanisms of Scanning Probe Microscopy in Electro-Optical Analysis

机译:扫描探针显微镜在电光分析中的机制

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摘要

Scanning probe microscopy is a key technology of nanometer-scale surface analysis, and highly valued among industries and academia. Scanning probe microscopy with atomic resolution can be used to measure the optical, electrical, magnetic, mechanical and many more other properties of the material surface. Near-field scanning optical microscopy breaks through the diffraction limit of conventional optical resolution, and conducting atomic force microscopy provides statistical analysis of surface electrical properties. They are extensively applied in the fields of physics, chemistry, material science and biology. The basic principles, system setup and applications of these two technologies that are upgraded from ordinary atomic force microscopes at ITRC (Instrument Technology Research Center) are introduced in this article.
机译:扫描探针显微镜是纳米尺度表面分析的关键技术,在行业和学术界的高度重视。 扫描具有原子分辨率的探针显微镜可用于测量材料表面的光学,电,磁,机械和越多的其他性质。 近场扫描光学显微镜通过常规光学分辨率的衍射极限断裂,传导原子力显微镜提供表面电性能的统计分析。 它们广泛应用于物理学,化学,材料科学和生物学领域。 本文介绍了从ITRC(仪器技术研究中心)的普通原子力显微镜升级的这两种技术的基本原理,系统设置和应用。

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