Relation between polysilane structures and pattern transfer properties for LSI lithography - polysilanes having both anti-reflective and pattern-transfer properties

摘要

Both high n,k values and pattern-transfer properties are needed for anti-reflective coatings on LSI fabrications. In this sense, polysilanes have advantages, compared to conventional organic polymers. Various polysilanes are synthesized, and their optical and pattern transfer properties are evaluated in order to obtain the optimal polysilane structures. Phenylsilyne is one of the best candidates for material fulfilling both properties.