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Edge Oxidation Effect of Chemical-Vapor-Deposition-Grown Graphene Nanoconstriction

机译:化学气相沉积生长石墨烯纳米收缩的边缘氧化效应

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摘要

The edge oxidation effects of chemical-vapor-deposition-grown graphene devices with nanoconstrictions of different sizes are presented. The effects of edge oxidation on the doping level of a nanoconstriction graphene device were identified by Raman spectroscopy and using the back-gate-voltage-dependent resistance. Strong p-type doping was observed as the size of nanoconstriction decreased. The Dirac point of the graphene device shifted toward positive voltage, and the positions of the G and 2D peaks in Raman spectroscopy shifted toward a higher wave number, indicating the p-type doping effect of the graphene device, p-type doping was lifted by deep-ultraviolet light illumination under a nitrogen atmosphere at room temperature, p-type doping was restored by deep-ultraviolet light illumination under an oxygen atmosphere at room temperature. Edge oxidation in the narrow structures explains the origin of the p-type doping effect widely observed in graphene nanodevices.
机译:提出了具有不同尺寸的纳米收缩的化学气相沉积生长石墨烯器件的边缘氧化效应。通过拉曼光谱法并使用背栅电压依赖性电阻来确定边缘氧化对纳米收缩石墨烯器件掺杂水平的影响。随着纳米收缩尺寸的减小,观察到强p型掺杂。石墨烯器件的狄拉克点向正电压偏移,拉曼光谱中的G和2D峰的位置向较高波数偏移,表明石墨烯器件的p型掺杂效应,p型掺杂通过在室温下在氮气氛下进行深紫外线照明,在室温下在氧气氛下通过深紫外线照明恢复p型掺杂。窄结构中的边缘氧化解释了在石墨烯纳米器件中广泛观察到的p型掺杂效应的起源。

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