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Quantum nanoconstrictions fabricated by cryo-etching in encapsulated graphene

机译:在封装的石墨烯中通过低温刻蚀制备的量子纳米收缩

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摘要

We report on a novel implementation of the cryo-etching method, which enabled us to fabricate low-roughness hBN-encapsulated graphene nanoconstrictions with unprecedented control of the structure edges; the typical edge roughness is on the order of a few nanometers. We characterized the system by atomic force microscopy and used the measured parameters of the edge geometry in numerical simulations of the system conductance, which agree quantitatively with our low temperature transport measurements. The quality of our devices is confirmed by the observation of well defined quantized 2e2/h conductance steps at zero magnetic field. To the best of our knowledge, such an observation reports the clearest conductance quantization in physically etched graphene nanoconstrictions. The fabrication of such high quality systems and the scalability of the cryo-etching method opens a novel promising possibility of producing more complex truly-ballistic devices based on graphene.
机译:我们报告了一种新型的低温蚀刻方法,该方法使我们能够制造出具有前所未有的结构边缘控制能力的低粗糙度hBN封装的石墨烯纳米颈缩。典型的边缘粗糙度约为几纳米。我们通过原子力显微镜对系统进行了表征,并在系统电导的数值模拟中使用了边缘几何形状的测量参数,这些参数在定量上与我们的低温传输测量结果吻合。通过在零磁场下观察到明确定义的量化2e 2 / h电导阶跃,可以确认我们设备的质量。据我们所知,这样的观察报告了物理蚀刻石墨烯纳米颈缩中最清晰的电导量化。这种高质量系统的制造和低温蚀刻方法的可扩展性为生产基于石墨烯的更复杂的真弹道装置打开了一种新的有希望的可能性。

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