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Thermal and Thermoelectric Measurements of Silicon Nanoconstrictions, Supported Graphene, and Indium Antimonide Nanowires.

机译:硅纳米管,负载石墨烯和锑化铟纳米线的热和热电测量。

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摘要

This dissertation presents thermal and thermoelectric measurements of nanostructures. Because the characteristic size of these nanostructures is comparable to and even smaller than the mean free paths or wavelengths of electrons and phonons, the classical constitutive laws such as the Fourier's law cannot be applied. Three types of nanostructures have been investigated, including nanoscale constrictions patterned in a sub-100 nm thick silicon film, monatomic thick graphene ribbons supported on a silicon dioxide (SiO, 2) beam, and indium antimonide (InSb) nanowires.;A suspended measurement device has been developed to measure the thermal resistance of 48-174 nm wide constrictions etched in 35-65 nm thick suspended silicon membranes. The measured thermal resistance is more than ten times larger than the diffusive thermal resistance calculated from the Fourier's law. The discrepancy is attributed to the ballistic thermal resistance component as a result of the smaller constriction width than the phonon-phonon scattering mean free path. Because of diffuse phonon scattering by the side walls of the constriction with a finite length, the phonon transmission coefficient is 0.015 and 0.2 for two constrictions of 35 nm x 174 nm x220 nm and 65 nm x 48 nm x 50 nm size.;Another suspended device has been developed for measuring the thermal conductivity of single-layer graphene ribbons supported on a suspended SiO, 2 beam. The obtained room-temperature thermal conductivity of the supported graphene is about 600 W/m-K, which is about three times smaller than the basal plane values of high-quality pyrolytic graphite because of phonon-substrate scattering, but still considerably higher than for common thin film electronic materials. The measured thermal conductivity is in agreement with a theoretical result based on quantum mechanical calculation of the three-phonon scattering processes in graphene, which finds a large contribution to the thermal conductivity from the flexural vibration modes.;A device has been developed to measure the Seebeck coefficients ( S) and electrical conductivities (sigma) of InSb nanowires grown by a vapor-liquid-solid process. The obtained Seebeck coefficient is considerably lower than the literature values for bulk InSb crystals. It was further found that decreasing the base pressure during the VLS growth results in an increase in the Seebeck coefficient and a decrease in the electrical conductivity, except for a nanowire with the smallest diameter of 15 nm. This trend is attributed to preferential oxidation of indium by residual oxygen in the growth environment, which could cause increased n-type Sb doping of the nanowires with increasing base pressure. The deviation in the smallest diameter nanowire from this trend indicates a large contribution from the surface charge states in the nanowire. The results suggest that better control of the chemical composition and surface states is required for improving the power factor of InSb nanowires. On approach is to use Indium-rich source materials for the growth to compensate for the loss of indium due to oxidation by residual oxygen.
机译:本文提出了纳米结构的热和热电测量。由于这些纳米结构的特征尺寸与电子和声子的平均自由程或波长相当,甚至更小,因此无法应用诸如傅立叶定律之类的经典本构定律。已经研究了三种类型的纳米结构,包括在小于100 nm厚的硅膜中图案化的纳米级缩颈,支撑在二氧化硅(SiO,2)束上的单原子厚石墨烯带以及锑化铟(InSb)纳米线。已开发出一种装置,用于测量在35-65 nm厚的悬浮硅膜中蚀刻的48-174 nm宽的缩颈的热阻。测得的热阻比根据傅立叶定律计算的扩散热阻大十倍以上。由于收缩宽度小于声子-声子散射平均自由程,因此归因于弹道热阻分量。由于狭窄侧壁的有限长度的扩散声子散射,两个尺寸为35 nm x 174 nm x220 nm和65 nm x 48 nm x 50 nm尺寸的狭窄部分的声子透射系数分别为0.015和0.2。已经开发出一种装置,用于测量支撑在悬浮的SiO 2束上的单层石墨烯带的热导率。所获得的负载型石墨烯的室温热导率约为600 W / mK,由于声子-基体的散射,它比高质量热解石墨的基面值小三倍,但仍比普通薄层高得多。电影电子材料。测得的热导率与基于石墨烯中三声子散射过程的量子力学计算的理论结果相符,这对弯曲振动模式对热导率有很大贡献。通过汽液固过程生长的InSb纳米线的塞贝克系数(S)和电导率(sigma)。获得的塞贝克系数明显低于块状InSb晶体的文献值。进一步发现,除了最小直径为15 nm的纳米线以外,在VLS生长过程中降低基压会导致塞贝克系数的增加和电导率的降低。这种趋势归因于铟在生长环境中被残留氧优先氧化,这可能会导致随着基底压力的增加,纳米线的n型Sb掺杂增加。最小直径纳米线与该趋势的偏差表明纳米线中表面电荷状态的贡献很大。结果表明,需要更好地控制化学成分和表面状态,以提高InSb纳米线的功率因数。一种可行的方法是使用富含铟的原料进行生长,以补偿由于残留氧的氧化而导致的铟损失。

著录项

  • 作者

    Seol, Jae Hun.;

  • 作者单位

    The University of Texas at Austin.;

  • 授予单位 The University of Texas at Austin.;
  • 学科 Engineering Mechanical.
  • 学位 Ph.D.
  • 年度 2009
  • 页码 98 p.
  • 总页数 98
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

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