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Near-field light focusing by a slit array in a planar metal film with nonuniform slit dielectric material

机译:狭缝阵列在具有不均匀狭缝介电材料的平面金属膜中通过狭缝阵列聚焦的近场光

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摘要

We study the interference of evanescent electromagnetic waves generated from multi-slits in a metal film and demonstrate the anomalous bending of light at infrared frequencies due to negative refraction. We also calculate the diffraction of an incident plane electromagnetic waves by a metallic film with an arbitrary linear array of slits, slit separation, and slit dielectric material. In contrast to a double-convex shaped quartz lens, we show that a planar metallic film with a one-dimensional slit array can also focus polarized light in the near-field region when either the slit width or the slit dielectric material becomes spatially nonuniform.
机译:我们研究了金属膜中多缝隙产生的e逝电磁波的干扰,并证明了由于负折射导致的红外频率的光的异常弯曲。我们还计算了具有缝,缝分离和缝介电材料的任意线性阵列的金属膜对入射平面电磁波的衍射。与双凸石英透镜相反,我们显示了当狭缝宽度或狭缝介电材料在空间上变得不均匀时,具有一维狭缝阵列的平面金属膜也可以将偏振光聚焦在近场区域中。

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