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首页> 外文期刊>日本溶射協会誌 >HVOF spraying of granulated SiO{sub}2/Al-Mg powder accompanied by in-process reaction
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HVOF spraying of granulated SiO{sub}2/Al-Mg powder accompanied by in-process reaction

机译:喷涂喷涂颗粒状SiO {Sub} 2 / Al-Mg粉末伴有加工过程反应

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Thermodynamically instable hard particles such as WC in composite spray materials are ready to decompose to W2C and tungsten during thermal spray process. so that composite coatings containing nitrides or carbides as a reinforcement have been recently fabricated by reactive thermal spraying based on in-process reactions. In the present study, instead of DC and RF plasma spraying, HVOF spraying characterized by high flame velocity and low flame temperature is applied to the formation of in situ composite coatings. Granulated particles of SiO{sub}2/Al-Mg with a SiO{sub}2·Na{sub}2O binder are sprayed onto an aluminum substrate. Through the reduction of SiO{sub}2 accompanied by an exothermic reaction, the composite coatings are expected to consist of MgAl{sub}2O{sub}4 and Al-Si alloy matrix. However, the sprayed coatings actually consist of MgAl{sub}2O{sub}4, Al-Si and additional Mg{sub}2Si. This is because the reaction rate of Mg{sub}2Si is much faster compared with that of MgAl{sub}2O{sub}4, although MgAl{sub}2O{sub}4 is more thermodynamically stable than Mg{sub}2Si. The amount of formed MgAl{sub}2O{sub}4 decreases with an increase in the spray distance, though the long spray distance gives a long dwelling period of droplets. Hence, the in-process reaction to form MgAl{sub}2O{sub}4 mainly occurs on a substrate in the present composite system.
机译:在热喷涂过程中,复合喷雾材料中的诸如WC的热力稳定的硬颗粒可以在热喷涂过程中分解为W2C和钨。因此,最近通过基于在过程中反应的反应热喷涂而制造含有氮化物或碳化物作为增强物的复合涂层。在本研究中,代替DC和RF等离子体喷涂,以高火焰速度和低火焰温度为特征的HVOF喷涂被施加到原位复合涂层的形成。用SiO {sub} 2 / Al-Mg用SiO {sub} 2·Na {Sub} 2O粘合剂喷涂到铝基板上。通过减少SiO {亚} 2伴随着放热反应,预期复合涂层由MGAL {亚} 2O} 4和Al-Si合金基质组成。然而,喷涂的涂层实际上由MGAL {sub} 2o {sub} 4组成,Al-Si和额外的Mg {sub} 2Si。这是因为与MGAL {Sub} 2O {Sub} 4的Mg {sub} 2Si的反应速率与MgAl {sub} 2o} 4相比要快得多。形成的MGAL {sub} 2o {sub} 4的量随着喷射距离的增加而减小,尽管长的喷射距离给出了长期的液滴时段。因此,形成MgAl {sub} 2O {sub} 4的过程中反应主要发生在本复合系统中的基板上。

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