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首页> 外文期刊>Journal of the Physical Society of Japan >Simulation of Oscillatory Scattered Ion Yields in He+-Metal Surface Scattering Including the Coulomb Repulsive Interaction
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Simulation of Oscillatory Scattered Ion Yields in He+-Metal Surface Scattering Including the Coulomb Repulsive Interaction

机译:振荡散射离子产量的模拟,包括库仑排斥相互作用

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The effect of the intra-atomic Coulomb repulsive interaction, U, between different electrons in He atoms on the ion survival probability (ISP) is calculated with the mean-field (Hartree-Fock) approximation when He+ is scattered from metals, such as Ga, In, Sn, and Pb. The results suggest that the period of the ISP oscillation is insensitive to U, with U interfering with only the resonant neutralization. The period is determined by the interaction between ions and the surface; a strong interaction shortens the period. In addition, ions are easily neutralized when bandwidth D is large. Furthermore, we simulate the scattered ion yield, assuming that U depends on the ion-metal distance because screening caused by the electron transfer increases as the distance decreases. The simulated scattered ion yield explains the observed yield qualitatively, implying that the screening of U plays an important role in the neutralization process.
机译:原子内库仑排斥相互作用u的效果,在离子存活概率(ISP)上的不同电子之间的不同电子之间用平均场(Hartree-Fock)近似计算从金属+(例如Ga) ,sn和pb。 结果表明ISP振荡的时期对U不敏感,US仅干扰共振中和。 该时段由离子和表面之间的相互作用决定; 强烈的互动缩短了这一时期。 此外,当带宽D大时,离子很容易中和。 此外,我们模拟散射的离子产量,假设U取决于离子金属距离,因为由于电子传递引起的屏幕随着距离而增加而增加。 模拟散射离子产率在定性地解释了观察到的产率,这意味着你的筛选在中和过程中发挥着重要作用。

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