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Surface plasmon field enhancement: excitation by a short pulse or narrow beam of light

机译:表面等离子体现场增强:通过短脉冲或窄光束激发

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With the advance of laser technology, there are many applications exciting surface plasmons with very short pulses of light. We perform a quantitative study of field amplification of surface plasmons excited by short light pulses. The dependence of the maximum intensity of the electromagnetic fields at the metal-dielectric interface is obtained as a function of the pulse duration. A Gaussian light pulse is used as the excitation source and the propagation of this pulse is computed on an attenuated total reflection system for the Kretschmann geometry. The field enhancement produced by the pulse is about 80% of the steady-state case when the width of the pulse is half the decay time of the surface plasmon, and it gets close to 95% when the width is equal to the time decay. We obtain an approximate expression for the field amplification as a function of the pulse width that is close to the exact calculation. Additionally, an approximate expression is obtained for the enhancement of the fields when surface plasmons are excited with a narrow spatial width beam. (C) 2018 Optical Society of America.
机译:随着激光技术的进展,有许多应用令人兴奋的表面等离子体,具有非常短的光脉冲。我们对短脉冲激发的表面等离子体的场扩增进行定量研究。获得金属介质接口处的电磁场的最大强度的依赖性作为脉冲持续时间的函数获得。使用高斯光脉冲用作激励源,并且在克莱茨曼几何形状的衰减总反射系统上计算该脉冲的传播。当脉冲的宽度是表面等离子体的衰减时间的一半时,由脉冲产生的现场增强约为80%,当宽度等于时间衰减时,它接近95%。我们获得了作为靠近精确计算的脉冲宽度的函数的场放大的近似表达式。另外,当用窄空间宽度光束激发表面等离子体时,获得近似表达式。 (c)2018年光学学会。

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