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首页> 外文期刊>Journal of the European Ceramic Society >Improvement of surge current performances of ZnO varistor ceramics via C3N4-doping
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Improvement of surge current performances of ZnO varistor ceramics via C3N4-doping

机译:通过C3N4掺杂改善ZnO变阻器陶瓷的浪涌电流性能

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摘要

ZnO-Bi2O3 based varistor ceramics doped with C3N4 were fabricated via solid state method. Experimental results show that C3N4 additive acts as an inhibitor in ZnO grain growth, and the average grain size decreases from 10.2-7.1 mu m. The varistor breakdown voltage gradient increases from 222.3-282.3 V/mm, and the nonlinear coefficient increases from 51.9-58.2 with the increase of C3N4 content from 0 to 3.0 wt%. The C3N4-added samples exhibited smaller residual voltage ratio and better surge current withstanding capability. It is proposed that the C3N4-doping leads to substitution of nitrogen for oxygen in the grain boundary region, forming acceptor type defects. The acceptor type defects act as electron traps, increasing the barrier height from 1.31 to 1.50 eV and the depletion layer width from 54.9-61.8 nm, which increases the nonlinearity, and the surge current performances of the C3N4 doped ZnO varistor ceramics are improved.
机译:通过固态法制造掺杂有C3N4的基于ZnO-Bi2O3的压敏电阻陶瓷。 实验结果表明,C3N4添加剂作为ZnO晶粒生长中的抑制剂,平均粒度从10.2-7.1μm降低。 压敏电阻击穿电压梯度从222.3-282.3V / mm增加,并且非线性系数从51.9-58.2增加,随着0至3.0wt%的增加,C3N4含量增加。 C3N4添加的样品表现出较小的残余电压比和更好的浪涌电流耐受能力。 提出,C3N4掺杂导致晶界区域中的氧含有氮,形成受体型缺陷。 受体型缺陷用作电子阱,从1.31增加到1.50eV,从54.9-61.8nm增加,耗尽层宽度增加,这增加了非线性,并且改善了C3N4掺杂ZnO压敏电阻陶瓷的浪涌电流性能。

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