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首页> 外文期刊>Journal of surface investigation: x-ray, synchrotron and neutron techniques >Formation of Intermetallic Compounds during the Ion-Plasma Sputtering of Metal Films on Diamond
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Formation of Intermetallic Compounds during the Ion-Plasma Sputtering of Metal Films on Diamond

机译:金刚石金属薄膜离子等离子体溅射期间形成金属间化合物

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摘要

The morphology of the metal films deposited onto diamond by the ion-plasma method at a temperature of 600°С under vacuum (10_(–2)Pa) are studied by scanning electron microscopy. It is shown that crystalline formations and needle structures are formed on the surface of the films. It is established by X-ray phase analysis that Ni~( m )Ti~( n )compounds are mainly formed.
机译:通过扫描电子显微镜研究在600℃的温度下,在600℃的温度下,通过离子等离子体法在金刚石上沉积在金刚石上的金属膜的形态(10℃)。 结果表明,在薄膜的表面上形成结晶形成和针结构。 由X射线相分析建立,即主要形成Ni〜(M)Ti〜(n)化合物。

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