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首页> 外文期刊>Journal of structural chemistry >Molecular Dynamics Study of the Deposition of Palladium-Silver Films on a Silver Substrate
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Molecular Dynamics Study of the Deposition of Palladium-Silver Films on a Silver Substrate

机译:银基质钯 - 银膜沉积的分子动力学研究

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摘要

The formation of PdxAg1-x thin films from the gas phase on silver substrates is modeled by molecular dynamics. The effect of substrate temperature on the structure of coatings of various compositions (x = 0, 0.25, 0.5, 0.75, 1) is studied in the range from 300 K to 900 K. The films are shown to have an unevenly deformed fcc structure over the entire range of considered temperatures and compositions. The surface of the coating is not smooth; it contains holes and cavities with a characteristic height difference of several angstroms. No misfit dislocations are formed in the studied systems. Higher substrate temperatures during the deposition of the coating lead to the increased average adsorption energy in the formed layer (which is true for all elemental compositions of the films.) This is caused by the fact that diffusion rate is higher on hotter substrates, and the surface of the coating is therefore smoothed. It is notable that the change of adsorption energy as a function of the substrate temperature during film deposition is directly proportional to the palladium content in the film. A high accuracy (above 0.01 eV) procedure is proposed for the calculation of cohesive energy in the film. This characteristic is shown to be virtually independent on the substrate temperature during nanolayer deposition. This is a direct indication that the structure of the coating volume is not changed, regardless of its elemental composition, as the temperature of formation increases.
机译:从银基板上的气相形成PDXAG1-X薄膜的形成是通过分子动力学的建模。在300k至900k的范围内研究基板温度对各种组合物涂层结构的影响整个范围的考虑温度和组合物。涂层的表面不平滑;它含有具有几个埃的特征高度差异的孔和腔。在研究的系统中没有形成错配脱位。在涂层沉积期间较高的基板温度导致形成的层中的平均吸附能量增加(这对于薄膜的所有元素组合物是真实的。)这是由于在更热的基材上的扩散速率较高的事实引起的因此平滑涂层的表面。值得注意的是,吸附能量的变化作为薄膜沉积期间的基板温度的函数与膜中的钯含量成比例。提出了高精度(高于0.01eV)程序,用于计算薄膜中的粘性能量。该特性显示在纳米沉积期间几乎独立于基板温度。这是一种直接指示,无论其元素组合物增加,涂层体积的结构都没有改变,因为形成的温度增加。

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