首页> 外文期刊>Journal of Materials Chemistry, C. materials for optical and electronic devices >Facile preparation of a high-quality copper layer on epoxy resin via electroless plating for applications in electromagnetic interference shielding
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Facile preparation of a high-quality copper layer on epoxy resin via electroless plating for applications in electromagnetic interference shielding

机译:通过化学镀用于环氧树脂的高质量铜层的浅色制备用于电磁干扰屏蔽的应用

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摘要

A convenient and low-cost approach to fabricate a high-quality copper layer on epoxy resin via electroless plating for applications in electromagnetic interference (EMI) shielding is introduced in this paper. Through the surface modification of thiosulfate (S2O32-), an epoxy resin substrate is able to adsorb silver ions, which could create a catalytic activating layer to catalyze the subsequent electroless copper plating (ECP) of a conductive deposited copper layer at low temperature. The effects of thiosulfate are evaluated based on water contact angle measurement, XPS, FT-IR, SEM, EDS and adhesion tests. The incorporation of thiosulfate effectively modifies the epoxy resin substrate surface, thus promoting adhesion between the epoxy resin and the deposited copper layer. Moreover, after 40 min of ECP, the resulting deposited copper layer presents a low resistivity of 2.24 x 10(-6) Omega cm and an excellent electromagnetic interference shielding effectiveness of greater than 60 dB in the frequency range from 4 GHz to 18 GHz. It can be concluded that the developed technology can be used to enable surface metallization of epoxy resin as a highly effective electromagnetic interference shielding material without the use of high temperatures or sophisticated manufacturing equipment.
机译:本文介绍了通过化学镀用于在环氧树脂上制造高质量铜层的便捷和低成本的方法,用于电磁干扰(EMI)屏蔽中的应用。通过硫代硫酸盐(S2O32-)的表面改性,环氧树脂基材能够吸附银离子,其​​可以产生催化活化层以在低温下催化导电沉积铜层的随后的无电铜电镀(ECP)。基于水接触角测量,XPS,FT-IR,SEM,EDS和粘附测试评估硫代硫酸盐的影响。硫代硫酸盐的掺入有效改变环氧树脂基材表面,从而促进环氧树脂和沉积的铜层之间的粘附性。此外,在ECP 40分钟后,所得沉积的铜层的低电阻率为2.24×10(-6)ωcm,并且在频率范围内的频率范围大于60dB的优异电磁干扰屏蔽效果。可以得出结论,开发技术可用于使环氧树脂的表面金属化能够作为高效的电磁干扰屏蔽材料,而不使用高温或复杂的制造设备。

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  • 作者单位

    Univ Elect Sci &

    Technol China State Key Lab Elect Thin Films &

    Integrated Devic Chengdu 610054 Sichuan Peoples R China;

    Univ Elect Sci &

    Technol China State Key Lab Elect Thin Films &

    Integrated Devic Chengdu 610054 Sichuan Peoples R China;

    Univ Elect Sci &

    Technol China State Key Lab Elect Thin Films &

    Integrated Devic Chengdu 610054 Sichuan Peoples R China;

    Univ Elect Sci &

    Technol China State Key Lab Elect Thin Films &

    Integrated Devic Chengdu 610054 Sichuan Peoples R China;

    Univ Cent Florida Nanosci Technol Ctr Orlando FL 32826 USA;

    Univ Cent Florida Nanosci Technol Ctr Orlando FL 32826 USA;

    Univ Elect Sci &

    Technol China State Key Lab Elect Thin Films &

    Integrated Devic Chengdu 610054 Sichuan Peoples R China;

    Univ Elect Sci &

    Technol China State Key Lab Elect Thin Films &

    Integrated Devic Chengdu 610054 Sichuan Peoples R China;

    Univ Elect Sci &

    Technol China State Key Lab Elect Thin Films &

    Integrated Devic Chengdu 610054 Sichuan Peoples R China;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 物理化学(理论化学)、化学物理学;
  • 关键词

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