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首页> 外文期刊>Journal of nanomaterials >Near-Edge X-Ray Absorption Fine Structure of Ultrananocrystalline Diamond/Hydrogenated Amorphous Carbon Films Prepared by Pulsed Laser Deposition
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Near-Edge X-Ray Absorption Fine Structure of Ultrananocrystalline Diamond/Hydrogenated Amorphous Carbon Films Prepared by Pulsed Laser Deposition

机译:近边缘X射线吸收精细结构脉冲激光沉积制备的超晶金刚石/氢化非晶碳膜的精细结构

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摘要

The atomic bonding configuration of ultrananocrystalline diamond (UNCD)/hydrogenated amorphous carbon (a-C:H) films prepared by pulsed laser ablation of graphite in a hydrogen atmosphere was examined by near-edge X-ray absorption fine structure spectroscopy. The measured spectra were decomposed with simple component spectra, and they were analyzed in detail. As compared to the a-C:H films deposited at room substrate-temperature, the UNCD/a-C:H and nonhydrogenated amorphous carbon (a-C) films deposited at a substrate-temperature of 550°C exhibited enhanced π~* and σ~*C= C peaks. At the elevated substrate-temperature, the π~* and σ~* C bonds formation is enhanced while the σ~*C–H and σ~* C–C bonds formation is suppressed. The UNCD/a-C:H film showed a larger σ~* C–C peak than the a-C film deposited at the same elevated substrate-temperature in vacuum. We believe that the intense σ~*C–C peak is evidently responsible for UNCD crystallites existence in the film.
机译:通过近边X射线吸收细结构光谱检查通过脉冲激光烧蚀石墨中石墨中石墨制备的超晶金刚石(UNCL)/氢化非晶碳(A-C:H)膜的原子键合构型。 测量的光谱用简单的组分光谱分解,并详细分析它们。 与沉积在室基质 - 温度下的AC:H薄膜相比,在550℃的底物 - 温度下沉积的UNC值/ Ac:H和非氢化的无定形碳(AC)膜表现出增强π〜*和σ〜* c = C峰值。 在升高的底物温度下,抑制σ〜* C-H和σ〜C-C键形成的π〜*和σ〜C键形成。 UNC值/ A-C:H薄膜显示比在真空中相同升高的基材温度下沉积的A-C膜更大的σ〜C-C峰值。 我们认为激烈的σ〜* C-C峰明显负责薄膜的UNC晶体存在。

著录项

  • 来源
    《Journal of nanomaterials》 |2009年第drn期|共5页
  • 作者单位

    Department of Applied Science for Electronics and Materials Kyushu University 6-1 Kasuga Fukuoka 816-8580 Japan;

    Department of Applied Science for Electronics and Materials Kyushu University 6-1 Kasuga Fukuoka 816-8580 Japan;

    Department of Applied Science for Electronics and Materials Kyushu University 6-1 Kasuga Fukuoka 816-8580 Japan;

    Department of Applied Science for Electronics and Materials Kyushu University 6-1 Kasuga Fukuoka 816-8580 Japan;

    Kyushu Synchrotron Light Research Center 8-7 Yayoigaoka Tosu Saga 841-0005 Japan;

    Kyushu Synchrotron Light Research Center 8-7 Yayoigaoka Tosu Saga 841-0005 Japan;

    Kyushu Synchrotron Light Research Center 8-7 Yayoigaoka Tosu Saga 841-0005 Japan;

    Department of Aeronautics and Astronautics Kyushu University 744 Motooka Nishi-ku Fukuoka 819-0395 Japan;

  • 收录信息
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 特种结构材料;
  • 关键词

    Absorption; Deposition; UNCD;

    机译:吸收;沉积;没有;

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