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Charge Transport Mechanism in Thick-Films of Surface Functionalized Silicon Nanocrystals

机译:表面官能化硅纳米晶体厚膜中的电荷输送机理

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Thick-films of functionalized silicon nanocrystals with different thicknesses have been analysed in a purposed device architecture at room temperature. Commercially prepared silicon nanocrystals with a mean diameter of 60 nm have been utilized with a pre-treatment process followed by functionalization. Detail analysis of current density-voltage characteristics of the thick films (350-850 nm) of silicon nanocrystals at room temperature reveals that the drifting of charge carriers follows a power law relationship (J similar to V-n) in the presence of exponentially distributed trap states. Moreover, a unique voltage dependence of the current density-voltage curves also reveals a transaction between direct and spin-selective Fowler-Nordheim tunnelling mechanisms.
机译:在室温下在饰品装置架构中分析了具有不同厚度的官能化硅纳米晶体的厚膜。 已经使用了平均直径为60nm的商业制备的硅纳米晶体,其具有预处理过程,然后进行官能化。 室温硅纳米晶体电流密度 - 电压特性的详细分析显示,在指数分布的陷阱状态下,电荷载体的漂移沿电荷载波的漂移遵循电力法关系(J类似于VN) 。 此外,电流密度 - 电压曲线的独特电压依赖性还揭示了直接和旋转选择性的Fowler-Nordheim隧道机构之间的交易。

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