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首页> 外文期刊>Journal of instrumentation: an IOP and SISSA journal >First annealing studies of irradiated silicon sensors with modified ATLAS pixel implantations
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First annealing studies of irradiated silicon sensors with modified ATLAS pixel implantations

机译:辐照硅传感器的第一次退火研究改进的阿特拉斯像素植入

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摘要

Planar silicon pixel sensors with modified n~+-implantation shapes based on the IBL pixel sensor were designed in Dortmund. The sensors with a pixel size of 250 μm× 50 μm are produced in n~+-in-n sensor technology. The charge collection efficiency should improve with electrical field strength maxima created by the different n~+-implantation shapes. Therefore, higher particle detection efficiencies at lower bias voltages could be achieved. The modified pixel designs and the IBL standard design are placed on one sensor to test and compare the designs. The sensor can be read out with the FE-I4 readout chip. At the iWoRiD 2018, measurements of sensors irradiated with protons and neutrons respectively at different facilities were presented and showed incongruent results. Unintended annealing during irradiation was considered as an explanation for the observed differences in the hit detection efficiency for two neutron irradiated sensors. This hypothesis will be examined and confirmed in this work, presenting first annealing studies of sensors irradiated with neutrons in Ljubljana.
机译:具有基于IBL像素传感器的改进的N〜+ -implantation形状的平面硅像素传感器是在多特蒙德设计的。具有250μm×50μm的像素尺寸的传感器在N〜+ -IN-N传感器技术中产生。电荷收集效率应通过不同的N〜+ -implantation形状产生的电场强度最大值改善。因此,可以实现较低偏置电压下的更高粒子检测效率。修改的像素设计和IBL标准设计放在一个传感器上以测试和比较设计。传感器可以用FE-I4读数芯片读出。在Iworid 2018,介绍了分别在不同设施处照射质子和中子的传感器的测量结果,并显示出不一致的结果。在照射期间的无意的退火被认为是对两个中子照射传感器的检测效率的观察差异的解释。在这项工作中,将在这项工作中进行检查并确认这一假设,提出了在卢布尔雅那在中子照射的传感器的首次退火研究。

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