Monte Carlo simulation of Auger electron emission from thin film on substrate

摘要

Highlights?Calculation of Auger signal intensity variation with overlayer thickness.?Performance of the Monte Carlo simulation of the Auger electronEN(E)-spectrum.?The intrinsic Auger electron spectrum obtained by two subtracing methods.?Single value of EAL is not enough for accurate measurement of film thickness.?Using of two parameters to characterize the calibration curve.AbstractA Monte Carlo simulation of production and emission of Auger electron signals in Auger electron spectroscopy (AES) has been performed to calculate the dependence of Auger electron intensity on film thickness for a film/substrate specimen. The electron spectrum is simulated, covering the energy range from the elastic peak down to Auger electron peak, by including bulk loss