首页> 外文期刊>Journal of computational and theoretical nanoscience >Theoretical analysis of diamond mechanosynthesis. Part III. Positional C-2 deposition on diamond C(110) surface using Si/Ge/Sn-based dimer placement tools
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Theoretical analysis of diamond mechanosynthesis. Part III. Positional C-2 deposition on diamond C(110) surface using Si/Ge/Sn-based dimer placement tools

机译:金刚石机械合成的理论分析。 第三部分。 使用基于Si / Ge / Sn的二聚体放置工具在金刚石C(110)表面上的位置C-2沉积

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This paper extends an ongoing computational and theoretical investigation of the vacuum mechanosynthesis of diamond on a clean C(110) diamond surface from carbon dimer (C,) precursors, using Si-, Ge-, and Sn-substituted triadamantane-based positionally-controlled DCB6 dimer placement tools. Interactions between the dimer placement tools and the C(110) surface are investigated by means of stepwise ab initio molecular dynamics (AIMD) simulations, using Density Functional Theory (DFT) with generalized gradient approximation (GGA), implemented in the VASP software package. The Ge-based tool tip provides better functionality over a wider range of temperatures and circumstances (as compared with the Si or Sn tool tips). The transfer of a single carbon dimer from the Si-based tool tip onto C(110) is not controllable at 300 K but is workable at 80 K; the Ge-based tool remains workable up to 300 K. Geometry optimization suggests the Sn-based tool deposits reliably but the discharged tool is distorted after use; stepwise AIMD retraction simulations (at 300 K for the Sn tip) showed tip distortion with terminating Sn atoms prone to being attracted towards the surface carbon atoms. Stepwise AIMD shows successful placement of a second dimer in a 1-dimer gapped position, and successful intercalation of a third dimer into the 1-dimer gap between two previously deposited dimers, on clean C(110) at 300 K using the Ge tool. Maximum tolerable dimer misplacement error, investigated by stepwise AIMD quantification, is 0.5 angstrom x (across trough) and 1.0 angstrom in y (along trough) for a positionally-correct isolated C-2 deposition, and 1.0 angstrom in x and 0.3 angstrom in y for C-2 intercalation between two gapped ad-dimers. Rotational, misplacement tolerances for dimer placement are +/- 30 degrees for the isolated dimer and -10 degrees/+22.5 degrees for the intercalated dimer in the xy plane, with a maximum tolerable "in plane" tip rolling angle of 32.5 degrees and "out-of-plane" tip rocking angle of 15 degrees for isolated dimer. Classical molecular dynamics (MID) analysis of a new Ge tooltip + handle system at 80 K and 300 K found that dimer positional uncertainty is halved by adding a crossbar in the most compliant direction. We conclude that the Si-based and Ge-based tools can operate successfully at appropriate temperatures, including up to room temperature for the Ge-based tool.
机译:本文延长了使用基于Si-,Ge-和Sn取代的三亚胺的定位控制的清洁C(110)金刚石表面上清洁C(110)金刚石表面上的金刚石真空机械合成的持续计算和理论研究DCB6二聚体放置工具。通过逐步的AB Initio分子动态(AIMD)模拟,使用具有广义梯度近似(GGA)的逐步AB Initio分子动态(AIMD)模拟来研究二聚体放置工具和C(110)表面之间的相互作用。基于GE的工具尖端在更广泛的温度和环境范围内提供更好的功能(与SI或SN工具提示相比)。将单个碳二聚体从基于Si的工具尖端转移到C(110)上,不控制在300k,但是在80 k下可行;基于GE的工具仍然可行,高达300 K.几何优化表明SN的工具沉积物可靠,但使用后放电工具扭曲;逐步瞄准缩回模拟(SN尖端为300K)显示尖端变形与终止Sn原子容易被吸引到表面碳原子。逐步的旨在在使用GE工具中,在1二聚体堵塞位置中的成功将第三二聚体的第二二聚体放入两个先前沉积的二聚体之间的三个二聚体间隙中。由逐步瞄准量化研究的最大可容许二聚体误差误差是0.5埃·X(跨越槽)和1.0埃(沿槽),用于在x和0.3埃中的位置校正分离的C-2沉积,1.0埃对于两个螺纹的分层之间的C-2嵌入。用于二聚体放置的旋转的误差公差是XY平面中的隔离二聚体的+/- 30度,并且在XY平面中的插入二聚体的-10度/ + 22.5度,最大可容忍的“平面”尖端滚动角度为32.5度和“孤立二聚体的外平面“尖端摇摆角为15度。在80 k和300k处的新GE工具提示+手柄系统的经典分子动力学(MID)分析发现,通过在最柔顺的方向上添加横杆,可以减半分位置不确定度。我们得出结论,基于SI的和GE基础的工具可以在适当的温度下成功运行,包括基于GE的工具的高度室温。

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