首页> 外文期刊>Journal of Applied Electrochemistry >Corrosion protection of bronze using 2,5-dimercapto-1,3,4-thiadiazole as organic inhibitor: spectroscopic and electrochemical investigations
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Corrosion protection of bronze using 2,5-dimercapto-1,3,4-thiadiazole as organic inhibitor: spectroscopic and electrochemical investigations

机译:使用2,5-DiMercapto-1,3,4-Thiadole作为有机抑制剂的青铜腐蚀保护:光谱和电化学研究

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摘要

Effect of 2,5-dimercapto-1,3,4-thiadiazole (DMTD) concentration on the electrochemical behaviour of bronze was studied in 30g L-1 sodium chloride (NaCl) by means of surface analyses and electrochemical techniques. Scanning electron microscopy (SEM) was used to observe surface morphology. Raman micro-spectroscopy was carried out to study chemical structure of deposited layers. X-ray photoelectron spectroscopy enabled elemental characterization as well as molecular structure investigation. Finally, electrochemical polarization and impedance permitted a thorough study of corrosion protection behaviour reached through the presence of DMTD-based organic layers on the surface. Above 1mM, a fast adsorption of DMTD on copper (Cu) and lead (Pb) allows a thin and blocking film to be formed on bronze surface. DMTD prevents oxide formation at high concentrations, and the surface film is mainly composed of Cu-I-DMTD and Cu-II-DMTD complexes as evidenced by spectroscopic techniques, with a bidentate adsorption at 1mM and monodentate adsorption at 10mM.
机译:通过表面分析和电化学技术在30g L-1氯化钠(NaCl)中研究了2,5-DiMercapTo-1,3,4-噻二唑(DMTD)浓度对青铜电化学行为的影响。扫描电子显微镜(SEM)用于观察表面形态。进行拉曼微光谱,以研究沉积层的化学结构。 X射线光电子能谱使能元素表征和分子结构调查。最后,电化学极化和阻抗允许彻底研究通过表面上存在DMTD的有机层达到的腐蚀保护行为。在1mm以上,在铜(Cu)和铅(Pb)上的快速吸附DMTD和铅(Pb)允许在青铜表面上形成薄且阻挡膜。 DMTD防止高浓度的氧化物形成,表面膜主要由Cu-1-DMTD和Cu-II-DMTD复合物组成,如光谱技术所证明的,在1mm下双齿吸附并在10mm下单常吸附。

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