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首页> 外文期刊>Journal of Applied Crystallography >Significant texture improvement in single-crystalline-like materials on low-cost flexible metal foils through growth of silver thin films
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Significant texture improvement in single-crystalline-like materials on low-cost flexible metal foils through growth of silver thin films

机译:通过银薄膜生长在低成本柔性金属箔上的单晶样材料的显着质地改善

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摘要

Low texture spreads of single-crystalline-like materials are critical for high performance of low-cost flexible semiconductors and second-generation high-temperature superconductors based on metal foils. For texture improvement, a single-crystalline-like Ag film is epitaxially grown on an ion-beam-assisted deposition TiN substrate using magnetron sputtering. Ultra-low texture spreads are found in the thin Ag film (similar to 330nm), with an out-of-plane texture spread (Delta omega) of similar to 1.03 degrees and an in-plane texture spread (Delta phi) of similar to 1.34 degrees. Compared with the texture spreads of the TiN substrate, Delta omega and Delta phi of the Ag film are reduced by similar to 42 and similar to 79%, respectively. Applying this Ag buffer, the texture spreads of a single-crystalline-like Ge film are reduced by similar to 37% (Delta omega) and similar to 36% (Delta phi). Factors contributing to the texture improvement by Ag are studied using single-crystalline-like Ag films with various thicknesses.
机译:单晶样材料的低质量差异对于基于金属箔的低成本柔性半导体和第二代高温超导体的高性能至关重要。为了纹理改进,使用磁控溅射在离子束辅助沉积锡基板上外延生长单晶样Ag膜。在薄的AG膜(类似于330nm)中发现超低纹理差异,与类似于1.03度和相似的平面内纹理传播(Delta Phi)的平面外纹理传播(Delta Omega)。 1.34度。与锡壳的纹理扩散相比,Ag膜的δω和ΔPHi分别减少到42并且类似于79%。施加该AG缓冲液,单晶样GE膜的纹理差异与37%(Delta Omega)相似,类似于36%(Delta phi)。使用具有各种厚度的单晶样Ag膜研究贡献AG的质地改善的因素。

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