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Microstructures of dome-shaped hillocks formed on B doped CVD homoepitaxial diamond films

机译:在B掺杂CVD主页型金刚石薄膜上形成的圆顶丘袋的微观结构

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Various types of harmful growth defects lowering crystal quality are often produced during growth of chemical vapor deposition (CVD) homoepitaxial diamond films. Among these, in this study, microstructures of the dome-shaped hillock (DH) have been studied in details mainly using cross-sectional transmission electron microscopy (TEM). TEM images and selected area electron diffraction patterns indicated that the internal of the DH is composed of single crystal (single domain) diamond whose crystallographic direction is the same as that of the film or the substrate. However, in the internal area of the DHs, there are many dislocations, most of which occur near the boundary regions between the film and the DH and extend to the inside of the DH. In the boundary regions, extra diffraction spots at 1/3 and 2/3 positions in fundamental reflections along [111] directions were observed in the selected area electron diffraction patterns, demonstrating that the boundary regions consist of hybrid structures of parents and twins with common {111} planes. It was also been found that particles (sub mu m in diameter) exist around the interface between the substrate and the film at the bottom of the DHs, strongly suggesting that the DHs nucleate from the particles around the interface.
机译:在化学气相沉积(CVD)同性记金刚石膜的生长期间通常产生降低晶体质量的各种类型的有害生长缺陷。其中,在该研究中,主要使用横截面透射电子显微镜(TEM)详细研究了圆顶形丘丘(DH)的微观结构。 TEM图像和所选区域电子衍射图案表明,DH的内部由单晶(单域)金刚石组成,其晶形方向与膜或基板的单晶方向相同。然而,在DHS的内部区域中,存在许多脱位,其中大部分是在膜和DH之间的边界区域附近发生并且延伸到DH的内部。在边界区域中,在所选择的区域电子衍射图案中观察到沿着[111]方向的基本反射的1/3和2/3位置的额外衍射点,表明边界区域由父母和双胞胎的混合结构组成{111}飞机。还发现,在DHS底部的基板和薄膜之间的界面周围存在颗粒(亚mu m in直径),强烈暗示DHS从界面周围的颗粒核成核。

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