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首页> 外文期刊>Diamond and Related Materials >Simultaneous N doping and reduction of GO: Compositional, structural characterization and its effects in negative electrostatic charges repulsion
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Simultaneous N doping and reduction of GO: Compositional, structural characterization and its effects in negative electrostatic charges repulsion

机译:同时掺杂和降低GO:组成,结构表征及其在负静电电荷排斥中的影响

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摘要

The present work is focused on the modification of reduced graphene oxide with nitrogen doping to achieve electrostatic charges repulsion as well as, the extensive characterization of generated material. Graphene related materials, such as graphene oxide (GO) and reduced graphene oxide (rGO) have a wide field of applications and can be easily modified to obtain specific characteristics such as the high repulsion capacity to negative electrostatic charges promoted by nitrogen doping and which may be useful in biomedical applications, for example, to repel negatively charged cholesterol particles, which are deposited in arterial walls and catalyze atherosclerosis disease. In this work we present detailed characterization graphene oxide (GO) and nitrogen doped reduced graphene oxide (N-rGO) obtained in a low temperature process. Stacked sheets of GO with wrinkles were found, by TEM a hexagonal atomic arrangement with a thickness of 2.2 nm was observed. A distortion of the network after doping was also found and was attributed to an increase in defects due to GO reduction and nitrogen presence. The interplanar spaces were corroborate by DRX being 3.51 angstrom for N-rGO and 8.37 angstrom for GO. The corresponding bonds for nitrogen doping were found by XPS and FTIR, the total content of N was 9.57% with predominance of pyrrolic nitrogen. By means of contact angle measurements, resultant angles for N-rGO samples were > 100 degrees with different biological materials negative charged, demonstrating the repulsion capacity of the N-rGO. From measurements by Electrostatic Force Microscopy (EFM) it was verified that the repulsive behavior is due to the electrical charge in the surface of N-rGO and the negative surface potential of the material was verified by Scanning Kelvin Probe Microscopy (SKPM). Finally, cell viability tests were carried out on endothelial cells, obtaining a favorable behavior in contact with N-rGO. The characterization results confirmed the reduction of graphene oxide doped with nitrogen and the increase of negative charge in the surface was attributed to the free electrons that have the pyrrolic nitrogen, which allows the repulsion of negative electric charges, making N-rGO an ideal candidate for different applications.
机译:本作本作的重点是用氮掺杂改性石墨烯氧化物,以实现静电电荷排斥,以及产生的材料的广泛表征。石墨烯相关材料,例如石墨烯氧化物(GO)和还原的氧化石墨烯(RGO)具有广泛的应用领域,并且可以容易地修改以获得特定的特征,例如由氮掺杂促进的负静电电荷的高排斥能力,并且可以例如,在生物医学应用中可用,以排斥带负电荷的胆固醇颗粒,其沉积在动脉壁和催化动脉粥样硬化疾病中。在这项工作中,我们呈现详细表征石墨烯氧化物(GO)和在低温过程中获得的氮气掺杂的石墨烯(N-RGO)。发现堆叠的圆形褶皱,通过TEM观察到厚度为2.2nm的六角形原子布置。还发现掺杂后网络的变形,并且由于降低和氮存在而导致的缺陷增加。 Drx的白夜间空间被Drx为3.51 Angstrom,用于N-RGO和8.37 Angstrom。通过XPS和FTIR发现氮掺杂的相应键,N的总含量为9.57%,具有吡咯氮的优势。通过接触角测量,N-RGO样品的结果角度> 100度,具有不同的生物材料负负荷,展示了N-RGO的排斥能力。通过静电力显微镜(EFM)从测量结果证明,通过扫描塞尔文探针显微镜(SKPM)验证了排斥行为,验证了材料的表面电荷。最后,在内皮细胞上进行细胞活力测试,获得与N-RGO接触的有利行为。表征结果证实,用氮气掺杂的石墨烯氧化物的还原,并且表面中的负电荷的增加归因于具有吡咯氮的自由电子,这允许负电荷的排斥,使N-RGO成为理想的候选者不同的应用程序。

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