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Secondary electron emission properties of double-layer B-doped diamond films

机译:双层B掺杂金刚石薄膜的二次电子发射性能

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摘要

B-doped double-layer diamond films were prepared by microwave plasma chemical vapor deposition. The effects of different B-doping concentrations on the crystal quality, surface morphology, surface composition and the conductivity, secondary electron emission performance of the films were investigated. It is found that the increased conductivity with increased B-doping is beneficial for secondary electron emission. However, the degraded crystal quality of diamond, increased surface sp(2) carbon and the segregation of B element at surface due to increased B-doping could degrade the secondary electron emission performance of the film. So it can be considered as a competition between improved vertical conductance that tends to increase secondary electron escape depth and finally degrading surface properties as a function of B-doping. The double-layer film with a light B-doping concentration has good crystal quality and enough conductivity, which helps to obtain the best secondary electron emission performance.
机译:通过微波等离子体化学气相沉积制备B掺杂双层金刚石薄膜。研究了不同B掺杂浓度对薄膜晶体质量,表面形态,表面组成和电导率的影响,薄膜的二次电子发射性能。结果发现,随着B掺杂增加的导电性增加是有益的二次电子发射。然而,由于B掺杂增加,金刚石的晶体,增加的表面SP(2)碳和B元素的分离的晶体质量和B元素的分离可能会降低薄膜的二次电子发射性能。因此,它可以被认为是改善垂直电导之间的竞争,这倾向于增加二次电子逃逸深度,并且最终降低表面性质作为B掺杂的函数。具有光B掺杂浓度的双层膜具有良好的晶体质量和足够的电导率,有助于获得最佳的二级电子发射性能。

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