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机译:通过电磁增强磁控溅射改善Cr-C-N涂层的放电和微观结构
State Key Laboratory of Advanced Welding and Joining Harbin Institute of Technology;
State Key Laboratory of Advanced Welding and Joining Harbin Institute of Technology;
State Key Laboratory of Advanced Welding and Joining Harbin Institute of Technology;
State Key Laboratory of Advanced Welding and Joining Harbin Institute of Technology;
Materials Engineering Department Southwest Research Institute;
Cr-C-N coatings; Electromagnetically enhanced magnetron sputtering; Coil current; Substrate current density; Microstructure;
机译:通过电磁增强磁控溅射改善Cr-C-N涂层的放电和微观结构
机译:灯丝放电电流对等离子体增强磁控溅射锡涂层微观结构和性能的影响
机译:直流电的微观结构和性能发展的研究磁控共溅射三元氮化钛铝涂层-第II部分-磁控放电功率的影响
机译:常规磁控溅射沉积和等离子增强磁控溅射沉积Ti-Si-C-N纳米复合涂层的比较研究
机译:溅射靶腐蚀及其对长时间直流磁控溅射镀膜的影响
机译:放电功率和热处理对射频磁控溅射沉积磷酸钙涂层的影响
机译:灯丝放电电流对等离子体增强磁控溅射锡涂层微观结构和性能的影响