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Radiation Defects in Aluminum Nitride under Irradiation with Low-Energy C2+ Ions

机译:低能量C2 +离子照射下氮化铝中的辐射缺陷

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The radiation resistance of ceramic materials based on aluminum nitride have been studied. The irradiation has been performed at a temperature of 300 K using 40-keV C2+ ions with a fluence varied from 10(14) to 10(15) ion/cm(2). The dependences of crystallographic characteristics and strength properties on the ion fluence have been determined on the basis of X-ray diffraction, scanning electron microscopy, and energy dispersive X-ray analysis data. It has been found that the irradiation results in the formation of an impurity phase Al4C3 in the surface layer, which leads to an increase in the lattice parameters. This finding indicates the implantation of C2+ ions and the formation of the interstitial phase in the structure.
机译:研究了基于氮化铝的陶瓷材料的辐射阻力。 使用40-keV C2 +离子在300k的温度下进行辐射,其流量从10(14)至10(15)离子/ cm(2)变化。 基于X射线衍射,扫描电子显微镜和能量分散X射线分析数据,确定了结晶特性和强度性质对离子注射的依赖性。 已经发现,照射导致在表面层中形成杂质相Al 4C3,这导致晶格参数的增加。 该发现表明C2 +离子的植入和结构中的间质阶段的形成。

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