首页> 外文期刊>Technical physics letters: Letters to the Russian journal of applied physics >Generation of Charge Carriers in Uniformly Heated Si-Ge Films Heavily Doped with Titanium
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Generation of Charge Carriers in Uniformly Heated Si-Ge Films Heavily Doped with Titanium

机译:在均匀加热的Si-Ge薄膜中产生电荷载体严重掺杂钛

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摘要

We have studied the generation of charge carriers and development of the electromotive force (emf) in uniformly heated n-type Si-Ge films heavily doped with titanium obtained by chemical-vapor deposition on p-type silicon substrates. A maximum emf value of similar to 3 mV was observed at temperatures within 500-600 K for dark short-circuit currents similar to 0.5-1 mu A, the value of which increased with the temperature to reach similar to 3 mu A at 800 K.
机译:我们已经研究了在P型硅基板上的化学 - 气相沉积在P型硅基板上的均匀加热的N型Si-Ge薄膜中产生电荷载体和电动势(EMF)的发电(EMF)。 在500-600K内的温度下观察到类似于3mV的最大EMF值,用于暗短路电流,其值随温度的增加而增加到800 k的3亩 。

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