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首页> 外文期刊>Ultramicroscopy >Calibration for medium resolution off-axis electron holography using a flexible dual-lens imaging system in a JEOL ARM 200F microscope
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Calibration for medium resolution off-axis electron holography using a flexible dual-lens imaging system in a JEOL ARM 200F microscope

机译:使用柔性双镜头成像系统在JEOL ARM 200F显微镜中校准中轴偏离轴电子全息术

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In this work the calibration of a medium resolution off-axis electron holography using a dual-lens imaging system in a JEOL ARM 200F is shown. The objective dual-lens configuration allows adjusting the field of view from 35 nm to 2.5 um. Subsequently, the parameters used in phase shift reconstruction were calibrated considering biprism voltage versus fringe spacing (a) and versus fringe width (W). The reliability of the transmission electron microscope performance using these parameters was achieved using gold nanoparticles of known size and adjusting the excitation voltage of the lenses.
机译:在该工作中,示出了使用JEOL ARM 200F中的双镜头成像系统校准中等分辨率偏离轴电子全息术。 客观双镜头配置允许将视野从35 nm调整为2.5μm。 随后,考虑双峰电压与条纹间距(a)和与条纹宽度(w)进行校准相移重建中使用的参数。 使用已知尺寸的金纳米颗粒和调节透镜的激励电压,实现了使用这些参数的透射电子显微镜性能的可靠性。

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